Rchr
J-GLOBAL ID：200901019198465209
Update date: Feb. 14, 2024
Matsuda Akihisa
マツダ アキヒサ | Matsuda Akihisa
Contact this researcher
You can send email directly to the researcher.
Affiliation and department：
National Institute of Advanced Industrial Science and Technology
About National Institute of Advanced Industrial Science and Technology
Search "National Institute of Advanced Industrial Science and Technology"
Homepage URL (1)：
http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=A71328294
Research keywords (5)：
プラズマ 非晶質の構造 薄膜 自然エネルギー
, Natural Energy
, Thin Films
, Structure of Amorphous Materials
, Plasma
Research theme for competitive and other funds (2)：
薄膜シリコン系太陽電池
Thin Film Silicon Solar Cells
MISC (39)：
Takuya Matsui, Akihisa Matsuda, Michio Kondo. High-rate microcrystalline silicon deposition for p-i-n junction solar cells. SOLAR ENERGY MATERIALS AND SOLAR CELLS. 2006. 90. 18-19. 3199-3204
K Ohno, K Murayama, A Matsuda. Hopping transport of electrons and holes at localized band tail states in amorphous hydrogenated silicon and amorphous heavy-hydrogenated silicon. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 2005. 44. 7A. 4764-4769
T Matsui, M Kondo, A Matsuda. Doping properties of boron-doped microcrystalline silicon from B2H6 and BF3: material properties and solar cell performance. JOURNAL OF NON-CRYSTALLINE SOLIDS. 2004. 338. 646-650
C Niikura, M Kondo, A Matsuda. Preparation of microcrystalline silicon films at ultra high-rate of 10 nm/s using high-density plasma. JOURNAL OF NON-CRYSTALLINE SOLIDS. 2004. 338. 42-46
C Niikura, N Itagaki, M Kondo, Y Kawai, A Matsuda. High-rate growth of microcrystalline silicon films using a high-density SiH4/H-2 glow-discharge plasma. THIN SOLID FILMS. 2004. 457. 1. 84-89
ｍore...
Education (3)：
Waseda University
Waseda University
Waseda University
Professional career (1)：
Doctor Engineering
Work history (2)：
(株)日本コロムビア
Columbia Co. LTD.
Awards (4)：
プラズマ材料科学賞
工業技術院長賞
Plasma Science for Materials Award
AIST Award
Association Membership(s) (2)：
応用物理学会
, Japan Society of Applied Physics
※ Researcher’s information displayed in J-GLOBAL is based on the information registered in
researchmap
.
For details, see here
.
Return to Previous Page
TOP
BOTTOM
