Rchr
J-GLOBAL ID：200901056092443080
Update date: Apr. 03, 2023
Haneji Nobuo
Haneji Nobuo
Homepage URL (1)：
http://www.hanelab.ynu.ac.jp/
Research field (2)：
Electronic devices and equipment
, Electric/electronic material engineering
Research theme for competitive and other funds (2)：
2005 - 2007 Embedded Capacitance in WLP
Silicon gatestuck
Papers (31)：
Hiroki Watanabe, Takumi Tokimitsu, Jyunko Shiga, Nobuo Haneji, Yukihiro Shimogaki. Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C4F6, by Plasma Enhanced Chemical Vapor Deposition. Jap. J. Appl. Phys. 2006. 45. 6. L151-L153
Wenwu Wang, Toshihide Nabatame, Nobuo Haneji, Yukihiro Shimogaki. Electrical and Thermal Stability Characteristics of HfCN Films as Metal Gate-Electrode Synthesized by Metalorganic Chemical Vapor Deposition. Jap. J. Appl. Phys. 2005. 44. 32. L1019-1021
Taro Arakawa, Yoshiki Awa, Tomoyoshi Ide, Nobuo Haneji, Kunio Tada, Masakazu Sugiyama, Hiromasa Shimizu, Yukihiro Shimogaki, Yoshiaki Nakano. Improved Etched Surface Morphology in Electron Cyclotron Resonance-Reactive Ion Etching of GaN by Cyclic Injection of CH4/H2/Ar and O2 with Constant Ar Flow. Jap. J. Appl. Phys. 2005. 44. 7B. 5819-5823
羽路伸夫, ポーンケオ・チャンタマリー, 毛利重信. 液相堆積シリコン酸化膜/シリコン界面特性の改善. 電気学会論文誌C. 2003. 123. 10. 1695-1699
N Haneji, G Segami, T Ide, T Suzuki, T Arakawa, K Tada, Y Shimogaki, Y Nakano. Electron cyclotron resonance-reactive ion etching of III-V semiconductors by cyclic injection of CH4/H-2/Ar and O-2 with constant Ar flow. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2003. 42. 6B. 3958-3961
ｍore...
MISC (1)：
シリコン酸化膜を水中で作る-室温での液相堆積法. BREAK THROUG. 1999. 161. 7-10
Books (1)：
アナログ集積回路設計技術
培風館 2003
Education (3)：
- 1985 The University of Tokyo Graduate School, Division of Engineering Department of Electronic Engineering
- 1982 The University of Tokyo Graduate School, Division of Engineering Department of Electronic Engineering
- 1980 The University of Tokyo Faculty of Engineering Depaartment of Electronic Engineering
Professional career (1)：
Ph D. of Engineering (The University of Tokyo)
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