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J-GLOBAL ID:200902256831641300   Reference number:05A0879459

Electrical and Thermal Stability Characteristics of HfCN Films as Metal Gate-Electrode Synthesized by Metalorganic Chemical Vapor Deposition

金属有機化学蒸着によって合成された金属ゲート電極としてのHfCN薄膜の電気と熱的安定性の特性化
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Volume: 44  Issue: 28-32  Page: L1019-L1021  Publication year: Aug. 10, 2005 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices 
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