Art
J-GLOBAL ID：200902058591592548
Reference number：87A0542677
Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation.
プラズマ増大化学蒸着 直接プラズマ励起と遠隔プラズマ励起の差
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Author (2)：
,
Material：
Volume：
5
Issue：
4 Pt 4
Page：
2231-2238
Publication year：
Jul. 1987
JST Material Number：
C0789B
ISSN：
0734-2101
CODEN：
JVTAD6
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Ionization phenomena
, Semiconductor thin films
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,
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