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J-GLOBAL ID:200902058591592548   Reference number:87A0542677

Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation.

プラズマ増大化学蒸着 直接プラズマ励起と遠隔プラズマ励起の差
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Volume:Issue: 4 Pt 4  Page: 2231-2238  Publication year: Jul. 1987 
JST Material Number: C0789B  ISSN: 0734-2101  CODEN: JVTAD6  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Ionization phenomena  ,  Semiconductor thin films 
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