New Protective Groups in Alicyclic Methacrylate Polymers for 193-nm Resists.

NOZAKI K; YANO E

Art

J-GLOBAL ID：200902106881201598 Reference number：97A0632263

New Protective Groups in Alicyclic Methacrylate Polymers for 193-nm Resists.

193nmレジスト用脂環式メタクリレート重合体中の新しい保護基

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Material：
Volume： 10 Issue： 4 Page： 545-550 Publication year： 1997
JST Material Number： L0202A ISSN： 0914-9244 CODEN： JSTEEW Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Homopolymerization , Manufacturing technology of solid-state devices

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Reference (15)：

1). K. Nozaki, K. Watanabe, T. Namiki, M. Igarashi, Y. Kuramitsu, and E. Yano, Symposium on Polymers for Microelectronics and Photonics at Pacifichem'95 (1995) No.321.
2). K. Nozaki, K. Watanabe, and E. Yano, Jpn. J. Appl. Phys., 35, Pt. 2, L 528-530 (1996).
3). K. Nozaki, K. Watanabe, E. Yano, A. Kotachi, S. Takechi, and I. Hanyu, J. Photopolym. Sci. Technol., 9 (3), 509 (1996).
4). S. Takechi, M. Takahashi, A. Kotachi, K. Nozaki, E. Yano, and I. Hanyu, J. Photopolym. Sci. Technol., 9 (3), 475 (1996).
5). S. Takechi, Y. Kaimoto, K. Nozaki, and N. Abe, J. Photopolym. Sci. Technol., 5 (3), 439 (1992).

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