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J-GLOBAL ID:200902145779286797   Reference number:01A0758406

Fluoropolymer Resist Materials for 157nm Microlithography.

157nmマイクロリソグラフィーのためのふっ素化重合体レジスト材料
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Volume: 14  Issue:Page: 669-674  Publication year: 2001 
JST Material Number: L0202A  ISSN: 0914-9244  CODEN: JSTEEW  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices 
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