Art
J-GLOBAL ID:200902166968193276   Reference number:00A0057095

Dependence of Crystal Quality on Residual Strain in Strain-Controlled Thin AlN Layer Grown by Metalorganic Vapor Phase Epitaxy.

有機金属気相エピタクシーによって成長させた歪制御AlN薄層における結晶品質の残留歪依存性
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Material:
Volume: 38  Issue: 11B  Page: L1296-L1298  Publication year: Nov. 15, 1999 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semiconductor thin films 

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