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J-GLOBAL ID:200902190683483090   Reference number:97A0592144

Development of CH4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film.

ダイヤモンド類似の炭素膜を作るための正に自己バイアスされた電極を使うCH4ラジオ周波数プラズマ促進化学蒸着法の開発
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Volume: 36  Issue: 5A  Page: 2817-2821  Publication year: May. 1997 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semiconductor thin films  ,  Magnetic materials 
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