Development of Novel Photosensitive Polymer Systems Using Photoacid and Photobase Generators.

SHIRAI M; SUYAMA K; OKAMURA H; TSUNOOKA M

Art

J-GLOBAL ID：200902195050102421 Reference number：03A0048534

Development of Novel Photosensitive Polymer Systems Using Photoacid and Photobase Generators.

光酸発生剤及び光塩基発生剤を用いた新しい感光性高分子の進歩

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Material：
Volume： 15 Issue： 5 Page： 715-730 Publication year： 2002
JST Material Number： L0202A ISSN： 0914-9244 CODEN： JSTEEW Document type： Article
Article type：文献レビュー Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Photochemical reactions

Reference (52)：

1). A. R. Pawloski, C. R. Szmanda, and P. F. Nealey, SPIE, 4345 (2001) 1056
2). M. Shirai, T. Shinozuka, and M. Tsunooka, J. Photopolym. Sci. Technol., 12 (1999) 721.
3). T. Shinozuka, M. Shirai, and M. Tsunooka, Eur. Polym. J., 37 (2001) 1625.
4). H. Ito, H. D. Truong, M. Okazaki, D. C. Miller, N. Fender, G. Breyta, P. J. Brock, G. M. Wallraff, C. E. Larson, and R. D. Allen, SPIE, 4690 (2002) 18
5). B. C. Trinque, B. P. Osborn, C. R. Chambers, Yu-Tsai Hsieh, S. Corry, T. Chiba, R. J. Hung, H. V. Tran, P. Zimmerman, D. Miller, W. Conley, and C. G. Willson, SPIE, 4690 (2002) 58.

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