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J-GLOBAL ID:200902195050102421   Reference number:03A0048534

Development of Novel Photosensitive Polymer Systems Using Photoacid and Photobase Generators.

光酸発生剤及び光塩基発生剤を用いた新しい感光性高分子の進歩
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Volume: 15  Issue:Page: 715-730  Publication year: 2002 
JST Material Number: L0202A  ISSN: 0914-9244  CODEN: JSTEEW  Document type: Article
Article type: 文献レビュー  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices  ,  Photochemical reactions 
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