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J-GLOBAL ID:200902199458274471   Reference number:97A0775356

Atomic Force Microscope Nanolithography on SiO2/Semiconductor Surfaces.

SiO2/半導体表面上での原子間力顕微鏡ナノリソグラフィー
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Volume: 36  Issue: 6B  Page: 4057-4060  Publication year: Jun. 1997 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices 
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