Art
J-GLOBAL ID：200902216490437368
Reference number：03A0506394
Estimation of Optimum Electron-Beam Projection Lithography Mask Biases Taking Coulomb Beam Blur into Consideration
Coulombビームぼけを考慮した最適電子ビーム投影式リソグラフィ用マスクバイアスの評価
-
Publisher site
Copy service
{{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=03A0506394©=1") }}
-
Access JDreamⅢ for advanced search and analysis.
{{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=03A0506394&from=J-GLOBAL&jstjournalNo=G0520B") }}
Author (6)：
,
,
,
,
,
Material：
Volume：
42
Issue：
6B
Page：
3816-3821
Publication year：
Jun. 30, 2003
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices
Reference (7)：
-
1) K. Nakajima, H. Yamashita, Y. Kojima, S. Hirasawa, T. Tamura, Y. Yamada, K. Tokunaga, T. Ema, K. Kondoh, N. Onoda and H. Nozue: Jpn. J. Appl. Phys. 36 (1997) 7535.
-
2) H. Kobinata, H. Yamashita, E. Nomura, K. Nakajima and Y. Kuroki: Jpn. J. Appl. Phys. 37 (1998) 6767.
-
3) S. D. Golladay, H. C. Pfeiffer, J. D. Rockrohr and W. Stickel: J. Vac. Sci. & Technol. <B>B18</B> (2000) 3072.
-
4) G. Owen: J. Vac. Sci. & Technol. <B>B8</B> (1990) 1889.
-
5) T. H. P. Chang: J. Vac. Sci. & Technol. <B>12</B> (1975) 1271.
ｍore...
Terms in the title (8)：
Terms in the title
Keywords automatically extracted from the title.
,
,
,
,
,
,
,
Return to Previous Page
