Art

J-GLOBAL ID：200902231435412495   Reference number：06A0557423

Observation of Sputtered Si Surface Irradiated with Metal Cluster Complex Ions

金属クラスタ錯体イオンを照射したスパッタSi表面の観測

Author (8)： TERANISHI Yoshikazu (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  KONDOU Kouji (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  FUJIWARA Yukio (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  NONAKA Hidehiko (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  TOMITA Misuhiro (Toshiba Corp., Yokohama, JPN) ,  YAMAMOTO Kazuhiro (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  FUJIMOTO Toshiyuki (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  ICHIMURA Shingo (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
Material： Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers  (Japanese Journal of Applied Physics. Part 1. Regular Papers, Brief Communications & Review Papers)
Volume： 45  Issue： 6B  Page： 5528-5530  Publication year： Jun. 30, 2006 
JST Material Number： G0520B  ISSN： 0021-4922  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： sputtering ,...
Semi thesaurus term： ion cluster

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JST classification (1)： Electron and ion sources  (BD02020U)

Reference (10)：

• A. Karen, K. Okuno, F. Soeda and A. Ishitani: J. Vac. Sci. Technol. A 9(1991)2247.
• Z. X. Jiang and P. F. A. Alkemade: Appl. Phys. Lett.73(1998)315.
• K. Wittmaack: J. Vac. Sci. Technol. A 8(1990)2246.
• F. A. Stevie, P. M. Kohara, D. S. Simons and P. Chi: J. Vac. Sci. Technol. A 6(1988)76.
• International Technology Roadmap for Semiconductors, 2001 ed.. Semiconductor Industry Association, 2001.

Terms in the title (5)： クラスタ錯体 ,  イオン ,  スパッタ ,  Si ,  観測