Cleaning Method for Thickness Metrology of SiO<sub>2</sub> Thin Films on Si Substrates by Heating in Atmosphere

AZUMA Yasushi; FUJIMOTO Toshiyuki; KOJIMA Isao

Art

J-GLOBAL ID：200902237806041728 Reference number：05A1022911

Cleaning Method for Thickness Metrology of SiO₂ Thin Films on Si Substrates by Heating in Atmosphere

雰囲気加熱によるSi基板上のSiO₂薄膜の厚み計測工学のための浄化法

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=05A1022911&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=05A1022911&from=J-GLOBAL&jstjournalNo=G0520B") }}

Author (3)： , ,
Material：
Volume： 44 Issue： 11 Page： 8256-8258 Publication year： Nov. 15, 2005
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：短報 Country of issue： Japan (JPN) Language： ENGLISH (EN)

,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=05A1022911&from=J-GLOBAL&jstjournalNo=G0520B") }}

Measuring methods and instruments of length,area,cross section,volume,angle

Reference (10)：

1) International Technology Roadmap for Semiconductor, 2003 ed., http://public.itrs.net/
2) M. P. Seah, S. J. Spencer, F. Bensebaa, I. Vickridge, H. Danzebrink, M. Krumrey, T. Gross, W. Oesterle, E. Wendler, B. Rheinländer, Y. Azuma, I. Kojima, N. Suzuki, M. Suzuki, S. Tanuma, D. W. Moon, H. J. Lee, H. M. Cho, H. Y. Chen, A. T. S. Wee, T. Osipowicz, J. S. Pan, W. A. Jordaan, R. Hauert, U. Klotz, C. van der Marel, M. Verheijen, Y. Tamminga, C. Jeynes, P. Bailey, S. Biswas, U. Falke, N. V. Nguyen, D. Chandler-Horowitz, J. R. Ehrstein, D. Muller and J. A. Dura: Surf. Interface Anal. 36 (2004) 1269.
3) M. P. Seah: J. Vac. Sci. Technol. A 22 (2004) 1564.
4) CCQM, Consultative Committee for Amount of Substance-Metrology in Chemistry, http://www.bipm.fr/en/committees/cc/ccqm/
5) D. A. Cole, J. R. Shallenberger, S. W. Novak, R. L. Moore, M. J. Edgell, S. P. Smith, C. J. Hitzman, J. F. Kirchhoff, E. Principe, W. Nieveen, F. K. Huang, S. Biswas, R. J. Bleiler and K. Jones: J. Vac. Sci. Technol. B 18 (2000) 440.

ｍore...

, , , , , ,

Return to Previous Page

Cleaning Method for Thickness Metrology of SiO2 Thin Films on Si Substrates by Heating in Atmosphere

Cleaning Method for Thickness Metrology of SiO₂ Thin Films on Si Substrates by Heating in Atmosphere