Grain Enlargement of Polycrystalline Silicon by Multipulse Excimer Laser Annealing: Role of Hydrogen

KAWAMOTO Naoya; MASUDA Atsushi; MATSUO Naoto; SERI Yasuhiro; NISHIMORI Toshimasa; KITAMON Yoshitaka; MATSUMURA Hideki; HAMADA Hiroki; MIYOSHI Tadaki

Art

J-GLOBAL ID：200902299302868961 Reference number：06A0340259

Grain Enlargement of Polycrystalline Silicon by Multipulse Excimer Laser Annealing: Role of Hydrogen

多重パルスエキシマレーザアニールによる多結晶シリコンの粒子拡大:水素の役割

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=06A0340259&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=06A0340259&from=J-GLOBAL&jstjournalNo=G0520B") }}

Author (9)： , , , , , , , ,
Material：
Volume： 45 Issue： 4A Page： 2726-2730 Publication year： Apr. 15, 2006
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=06A0340259&from=J-GLOBAL&jstjournalNo=G0520B") }}

Structure of other amorphous materials , Techniques and equipment of thin film deposition

Reference (21)：

J. S. Im, H. J. Kim and M.0. Thompson: Appl. Phys. Lett.63(1993)1969.
R. S. Sposili and J. S. Im: Appl. Phys. Lett.69(1996)2864.
C. H. Oh, M. Ozawa and M. Matsumura: Jpn. J. Appl. Phys.37(1998) L492.
T. Sameshima, M. Hara and S. Usui: Jpn. J. Appl. Phys.28(1989)1789.
R. lshihara, P. C. van der Wilt, B. D. van Dijk, A. Burtsev, J. W. Metselaar and C. I. M. Beenakker: Dig. Tech. Pap. AM-LCD, 2002, p. 53.

ｍore...

, , , ,

Return to Previous Page