Art

J-GLOBAL ID：201002268958524523   Reference number：10A0356144

Preparation of Tungsten Carbide Films by Pulsed Vacuum Arc Deposition

パルス真空アーク蒸着法による炭化タングステン膜の合成

Author (2)： AIZAWA KOICHI (東京工大 大学院) ,  HIRATA ATSUSHI (東京工大 大学院)
Material： 精密工学会誌(CD-ROM)  (精密工学会誌論文集)
Volume： 76  Issue： 4  Page： 453-457  Publication year： Apr. 05, 2010 
JST Material Number： F0268B  ISSN： 1348-8716  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)

Thesaurus term： *tungsten carbide ,  *evaporated film ,  ion plating ,  silicon ,  substrate (plate) ,  magnetron sputtering ,  synthesis ,  abrasion resistance ,  friction coefficient ,  wear ,  X-Ray Diffraction ,  *pulse wave ,  *mechanical property ,  *vacuum arc deposition ,  comparative abrasion quantity ,  resistance (endure) ,  *property
Semi thesaurus term： pulse voltage

JST classification (2)： Vapor plating  (WC08022K) ,  Gas discharges  (BJ03020T)

Reference (11)：

• 1) C. Rincon, G. Zambrano, A. Carvajal. P. Prieto, H. Galindo, E. Martinez, A. Lousa and J. Esteve : Tungsten carbide/diamond-like carbon multilayer coatings on steel for tribological applications, Surface and Coatings Technology, 148, (2001) 277.
• 2) Ho Y. Lee, Jeon G. Han, Seung H. Baeg and Se H. Yang : Characterization of WC-CrAlN heterostructures obtained using a cathodic arc ion plating process, Surface and Coatings Technology, 174-175, (2003) 303.
• 3) Kendra A. Beadle, Rahul Gupta, Anoop Mathew, Jingguang G. Chen and Brian G. Willis : Chemical vapor deposition of phase-rich WC thin films on silicon and carbon substrates, Thin Solid Films, 516, (2008) 3847.
• 4) K. Abdelouahdi, C. Sant, C. Legrand-Buscema, P. Aubert, J. Perriere, G. Renou and Ph. Houdy : Microstructural and mechanical investigations of tungsten carbide films deposited by reactive RF sputtering, Surface and Coatings Technology, 200, (2006) 6469.
• 5) H. Y. Lee, Y. M. Kim, W. S. Jung, J. G. Han, J. H. Kim and E. H. Bae : Synthesis of WC-Ni films using an arc ion plating system with attached solenoid coil, Surface and Coatings Technology, 193, (2005) 303.

Terms in the title (3)： パルス ,  真空アーク蒸着 ,  炭化タングステン