Art

J-GLOBAL ID：201002272618997602   Reference number：10A0710758

Integration of Directed Self-Assembly with 193nm Lithography

193nmリソグラフィーによる指向性自己集合の統合

Author (10)： SANDERS Daniel P. (IBM Almaden Res. Center, CA, USA) ,  CHENG Joy (IBM Almaden Res. Center, CA, USA) ,  RETTNER Charles T. (IBM Almaden Res. Center, CA, USA) ,  HINSBERG William D. (IBM Almaden Res. Center, CA, USA) ,  KIM Ho-Cheol (IBM Almaden Res. Center, CA, USA) ,  TRUONG Hoa (IBM Almaden Res. Center, CA, USA) ,  FRIZ Alexander (IBM Almaden Res. Center, CA, USA) ,  HARRER Stefan (IBM Albany Nanotech, NY) ,  HOLMES Steven (IBM Albany Nanotech, NY) ,  COLBURN Matthew (IBM Albany Nanotech, NY)
Material： Journal of Photopolymer Science and Technology  (フォトポリマー懇話会誌)
Volume： 23  Issue： 1  Page： 11-18  Publication year： 2010 
JST Material Number： L0202A  ISSN： 0914-9244  CODEN： JSTEEW  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： self assembly ,  *photolithography ,  topography ,  *pattern formation ,  wafer ,  *semiconductor device ,  polystyrene ,  Polymethyl Methacrylate ,  *block copolymer ,  epitaxy ,  numerical aperture ,  exposure (photography)
Semi thesaurus term： immersion lithography ,  指向性自己集合

JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Reference (20)：

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Terms in the title (4)： リソグラフィー ,  指向性 ,  自己集合 ,  統合