Art

J-GLOBAL ID：201002287815208030   Reference number：10A0843403

Development of a MEMS Gas Flow Sensor Unified with an Impurity-Gas Concentration Sensor

MEMSガスフローセンサと不純物ガス濃度センサ一体型センサの開発

Author (5)： ABE YASUHIRO ((株)MKTタイセー) ,  KOSAKA JUN'ICHI ((株)タイセー) ,  OE TOSHIAKI (ヘンミ計算尺(株)) ,  ISHIHARA SEIJI (フローテクノサービス) ,  KIMURA MITSUTERU (東北学院大学)
Material： 電気学会論文誌 E  (IEEJ Transactions on Sensors and Micromachines)
Volume： 130  Issue： 8  Page： 412-416 (J-STAGE)  Publication year： 2010 
JST Material Number： L3098A  ISSN： 1341-8939  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)

Thesaurus term： *MEMS ,  *gas sensor ,  sensor ,  flow meter ,  *impurity concentration ,  *flow measurement ,  *thermocouple ,  semiconductor chip ,  *semiconductor integrated circuit ,  flow sensor ,  *measurement

JST classification (2)： Manufacturing technology of solid-state devices  (NC03030V) ,  Analytical instruments  (CC02020S)

Reference (6)：

• KANEKO, T. Thin film growth of silicon cardide from methyl-trichloro-silane by RF plasma-enhanced CVD. Journal of Crystal Growth. 1997, 174, 1-4, 658-661
• KIMURA, M. Microheater and microbolometer using microbridge of SiO2 film on Silicon. Electronics Letters. 1981, 17, 2, 80-82
• NEDA, T. A polysilicon flow sensor for gas flow meters. Sensors and Actuators A : Physical. 1996, 54, 1-3, 626-631
• NEDA, T. Integrated and microheater embedded gas sensor array based on the polymer composites dispensed in micromachined wells. Sensors and Actuators B. 2005, 105, 549-555
• RHO, S. C. Sensitivity enhancement of a silicon micro-machined thermal flow sensor. Sensors and Actuators A : Physical. 2006, 128, 1, 1-6

Terms in the title (5)： MEMS ,  不純物ガス ,  濃度センサ ,  体型 ,  開発