Art

J-GLOBAL ID：201102236283525450   Reference number：11A1170815

Preparation of Pt-deposited TiO₂ films and evaluation of photocatalytic properties

Ptを析出させたTiO₂膜の作製と光触媒特性の評価

Author (4)： ISAI Masaaki (Shizuoka Univ., Hamamatsu, JPN) ,  NAKAMURA Ikuta (Shizuoka Univ., Hamamatsu, JPN) ,  ITO Tatsuya (Shizuoka Univ., Hamamatsu, JPN) ,  HOSHI Yoichi (Tokyo Polytechnic Univ., Kanagawa, JPN)
Material： Transactions of the Materials Research Society of Japan  (Trans Mater Res Soc Jpn)
Volume： 36  Issue： 2  Page： 261-264  Publication year： Jun. 2011 
JST Material Number： L4468A  ISSN： 1382-3469  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *titanium oxide ,  substrate (plate) ,  Glass ,  magnetron sputtering ,  *sputtered deposition ,  evaporated film ,  oxide ,  *thin film ,  *Platinum ,  metallization (IC) ,  *photocatalyst ,  catalytic activity ,  transmissivity ,  energy gap ,  anatase ,  hydrophilicity ,  velocity ,  thiazine dye ,  nitrogen heterocyclic compound ,  aromatic amine ,  sulfonium ,  sulfur heterocyclic compound ,  polynuclear aromatic compound ,  tertiary amine ,  photocatalytic activity ,  oxide thin film ,  catabolic rate
Semi thesaurus term： *metallization

JST classification (2)： Photochemistry in general  (CB08010U) ,  Oxide thin films  (BK14050P)

Substance index (1)： Methylene blue

Reference (10)：

• [1] A. Fujishima and K. Honda, "Electrochemical Photolysis of Water at a Semiconductor Electrode", Nature 37 pp.238(1972).
• [2] T. Takahashi, Y. Hoshi, S. Kawaguchi, E.Suzuki, and O. Kamiya, "Investigation oh High Rate Sputtering Method for the Deposition of TiO² Films", IEICE Tech. Re. of IECE 2004-133(2004-11), pp.33-38 (2004).
• [3] Y. Hoshi, S. Kawaguchi, O. Kamiya, and H. Shimizu, "High Rate Deposition of TiO2 thin films by plasma assisted reactive electron beam evaporation", IEICE Tech. Re. CPM2006-45, pp.25-29(2006).
• [4] J. Musil, D. Herman and J. Sicha, "Low-temperature sputtering of crystalline TiO2 films", J. Vac. Sci. Tech. A Vol.24 No.3 pp.521-528(2006).
• [5] T. Yazaki, T. Nagata, T. Takahashi and Y. EMA, "Preparation of N-doped TiO2 Thin Films by Sputtering Using TiO2: TiN Mixed Target", IEICE Tech. Re. CPM2007-26 , pp.97-102, (2007).

Terms in the title (6)： PT ,  析出 ,  TiO2 ,  作製 ,  触媒特性 ,  評価