Art

J-GLOBAL ID：202002244477973727   Reference number：20A1884618

Influence of oxygen assisted recombination on persistent photocurrent characteristics of ZnO polycrystalline thin films prepared by RF magnetron sputtering

RFマグネトロンスパッタリング法で作製したZnO多結晶薄膜の残留光電流特性に及ぼす酸素アシスト再結合の影響

Author (6)： Worasawat Suchada (Graduate School of Science and Technology, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan) ,  Worasawat Suchada (Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan) ,  Neo Yoichiro (Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan) ,  Hatanaka Yoshinori (Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan) ,  Pecharapa Wisanu (College of Nanotechnology, King Mongkut’s Institute of Technology Ladkrabang, Bangkok, 10520, Thailand) ,  Mimura Hidenori (Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan)
Material： Japanese Journal of Applied Physics  (JJAP)
Volume： 59  Issue： 7  Page： 075505 (8pp)  Publication year： Jul. 2020 
JST Material Number： G0520B  ISSN： 0021-4922  CODEN： JJAPB6  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Thesaurus term： sputtered deposition ,  magnetron sputtering ,  *zinc oxide ,  *thin film ,  *residual photoconductivity ,  carrier recombination ,  Oxygen ,  attenuation characteristic ,  ultraviolet irradiation ,  atmosphere (environment) ,  *polycrystalline thin film ,  argon atmosphere ,  oxygen atmosphere
Semi thesaurus term： RF magnetron sputtering ,  ZnO

JST classification (2)： Oxide thin films  (BK14050P) ,  Luminescence of semiconductors  (BM08092S)

Terms in the title (10)： RFマグネトロンスパッタリング ,  作製 ,  ZnO ,  多結晶薄膜 ,  残留 ,  光電 ,  流特性 ,  酸素 ,  アシスト ,  再結合