Art
J-GLOBAL ID:202002258466080500   Reference number:20A0023765

Annealing effects on the properties of nitrogen doped DLC films

窒素を添加したDLC膜特性へのアニール効果
Author (8):
Material:
Volume: 119  Issue: 271(CPM2019 44-51)  Page: 9-14  Publication year: Oct. 31, 2019 
JST Material Number: S0532B  ISSN: 0913-5685  Document type: Proceedings
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

JST classification (1):
JST classification
Category name(code) classified by JST.
Semiconductor thin films 
Reference (17):
Terms in the title (4):
Terms in the title
Keywords automatically extracted from the title.

Return to Previous Page