Art

J-GLOBAL ID：202002267232972434   Reference number：20A0023766

Nitrogen doping to ZnO films in a catalytic reaction assisted chemical vapor deposition

触媒反応支援CVD法におけるZnO膜への窒素ドーピング

Author (6)： IBA RYUTA (長岡技科大) ,  KAMBAYASHI HIROKI (長岡技科大) ,  ADACHI YUDAI (長岡技科大) ,  OISHI KOICHIRO (長岡工高専) ,  KATAGIRI HIRONORI (長岡工高専) ,  YASUI KANJI (長岡技科大)
Material： 電子情報通信学会技術研究報告  (IEICE Technical Report (Institute of Electronics, Information and Communication Engineers))
Volume： 119  Issue： 271(CPM2019 44-51)  Page： 15-19  Publication year： Oct. 31, 2019 
JST Material Number： S0532B  ISSN： 0913-5685  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)

Thesaurus term： *zinc oxide ,  *thin film ,  catalytic reaction ,  *chemical vapor deposition ,  doping ,  Nitrogen ,  Iridium ,  Platinum ,  nano particle ,  precursor (fluid wave) ,  epitaxy ,  X-Ray Diffraction ,  secondary ion mass spectrometry ,  X-ray photoelectron spectroscopy ,  water molecule

JST classification (1)： Oxide thin films  (BK14050P)

Reference (11)：

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Terms in the title (5)： 触媒反応 ,  支援 ,  CVD法 ,  ZnO ,  窒素ドーピング