Art

J-GLOBAL ID：202002277759568954   Reference number：20A0176184

Relationship between Oxygen Additive Amount and Photoresist Removal Rate Using H Radicals Generated on an Iridium Hot-Wire Catalyst

イリジウム熱線触媒上に生成したHラジカルを用いた酸素添加量とフォトレジスト除去速度の関係

Author (7)： Yamamoto Masashi (Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College) ,  Shiroi Tomohiro (Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College) ,  Shikama Tomokazu (Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College) ,  Nagaoka Shiro (Department of Electronic Systems Engineering, National Institute of Technology, Kagawa College) ,  Umemoto Hironobu (Graduate School of Integrated Science and Technology, Shizuoka University) ,  Umemoto Hironobu (Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University) ,  Horibe Hideo (Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University)
Material： Journal of Photopolymer Science and Technology (Web)
Volume： 32  Issue： 4  Page： 609-614(J-STAGE)  Publication year： 2019 
JST Material Number： U2132A  ISSN： 1349-6336  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *photoresist ,  *removal ,  radical ,  hydrogen ,  oxygenation ,  transition metal catalyst ,  velocity ,  *decomposition reaction ,  catalyst poison ,  hydroxyl radical ,  *radical reaction ,  green chemistry
Semi thesaurus term： *フォトレジスト除去 ,  hydrogen radical ,  oxygen addition ,  熱線触媒 ,  イリジウム熱線触媒 ,  iridium catalyst ,  heat ray ,  removal velocity ,  poisoning ,  触媒被毒 ,  OH radical ,  *ラジカル分解反応 ,  green chemistry

Author keywords (5)： Photoresist ,  Removal ,  Radical ,  Oxygen addition ,  Ir hot-wire catalyst

JST classification (2)： Manufacturing technology of solid-state devices  (NC03030V) ,  Photochemical reaction,radical reaction  (CF02090A)

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Terms in the title (7)： イリジウム ,  熱線 ,  触媒 ,  ラジカル ,  酸素添加 ,  フォトレジスト ,  除去速度