Rchr
J-GLOBAL ID：200901006218220521
Update date: Aug. 28, 2020
Komuro Masanori
コムロ マサノリ | Komuro Masanori
Affiliation and department：
National Institute of Advanced Industrial Science and Technology
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Homepage URL (1)：
http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=M82577733
MISC (9)：
H Hiroshima, M Komuro, Y Kurashima, SH Kim, T Muneishi. Step-and-repeat photo-nanoimprint system using active orientation head. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2004. 43. 6B. 4012-4016
Y Kurashima, H Hiroshima, M Komuro, SH Kim, N Yamazaki, J Taniguchi, Miyamoto, I, H Namatsu, S Matsui. Fabrication of low line edge roughness mold for photo-nanoimprint. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 2004. 43. 6B. 4045-4049
SH Kim, H Hiroshima, S Inoue, Y Kurashima, M Komuro. Reducing photocurable polymer pattern shrinkage and roughness during dry etching in photo-nanoimprint lithography. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2004. 43. 6B. 4022-4026
SH Kim, H Hiroshima, S Inoue, Y Kurashima, M Komuro. Fabrication of trilayer resist using photocuring-imprint lithography. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2003. 21. 6. 3144-3148
Y Kurashima, M Komuro, H Hiroshima, J Taniguchi, Miyamoto, I. Evaluation of line edge roughness in nanoimprint lithography using photocurable polymer. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 2003. 42. 6B. 3871-3873
ｍore...
Professional career (1)：
理学博士
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