Art

J-GLOBAL ID：200902253290751664   Reference number：03A0506405

Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer

光硬化性ポリマーを用いたナノリソグラフィにおけるラインエッジ粗さの評価

Author (5)： KURASHIMA Y (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  KOMURO M (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  HIROSHIMA H (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  TANIGUCHI J (Tokyo Univ. Sci., Chiba, JPN) ,  MIYAMOTO I (Tokyo Univ. Sci., Chiba, JPN)
Material： Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers  (Japanese Journal of Applied Physics. Part 1. Regular Papers, Brief Communications & Review Papers)
Volume： 42  Issue： 6B  Page： 3871-3873  Publication year： Jun. 30, 2003 
JST Material Number： G0520B  ISSN： 0021-4922  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： etching ,...
Semi thesaurus term： photocrosslinking ,...

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JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

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• 4) H. Hiroshima, S. Inoue, N. Kasahara, J. Taniguchi, I. Miyamoto and M. Komuro: Jpn. J. Appl. Phys. 41 (2002) 4173.
• 5) M. Komuro, J. Taniguchi, S. Inoue, N. Kimura, Y. Tokano, H. Hiroshima and S. Matsui: Jpn. J. Appl. Phys. 39 (2000) 7075.

Terms in the title (5)： 光硬化 ,  ポリマー ,  ナノリソグラフィ ,  ラインエッジ粗さ ,  評価