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J-GLOBAL ID：200901000199285805 Update date: Dec. 18, 2024

Ono Toshiro

オノトシロウ | Ono Toshiro

Research field (4)： Material fabrication and microstructure control , Mechanics and mechatronics , Robotics and intelligent systems , Manufacturing and production engineering

Research keywords (8)：誘電体薄膜形成 , 半導体加工 , マイクロマシン , 薄膜 , プラズマ , MEMS , thin film , plasma

Research theme for competitive and other funds (7)：

2006 - 2011 医用システム開発
2004 - 2011 キャパシタ用高誘電体薄膜の形成技術
2009 - 2010 内視鏡医療トレーニングのための括約筋をもつアクティブ臓器モデルの開発
2008 - 2010 Investigation of deposition process and electrical chracteristics of oxy-nitride dielectrics by using ECR sputtering
2005 - 2007 Development of magnetostrictive foil with nano multilayer-hetero magnetic domain driven by lower magnetic field

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Papers (7)：

K Saito, Y Jin, T Ono, M Shimada. Metal-oxide-semiconductor-diode characteristics with SiO2 films formed by oxidation and sputtering using electron-cyclotron-resonance-plasma stream. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 2005. 44. 2. 1031-1036
Y Jin, M Shimada, T Ono. Electron-cyclotron-resonance sputtering apparatus for multilayered optical bandpass filters applicable to wavelength division multiplexing. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2004. 22. 6. 2431-2436
H Nishimura, T Ono, M Oda, S Matsuo. Tantalum film for x-ray lithography mask deposited by electron cyclotron resonance plasma source coupled with divided microwaves. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2004. 22. 1. 40-45
Y Jin, C Takahashi, T Ono. Real-time etching monitor using argon quadrupole mass spectrometry for 100 nm class WSiN gate fabrication. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. 2003. 21. 5. 1589-1594
T Tsuchizawa, C Takahashi, M Shimada, S Uchiyama, T Ono, M Oda. Fine pattern fabrication of alpha-type Ta on a membrane for X-ray mask absorber using ECR ion stream etching. MICROELECTRONIC ENGINEERING. 2000. 53. 1-4. 595-598

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MISC (11)：

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Patents (6)：

電磁波導波管及びその結合構造
エッチング終点判定方法
膜形成用プラズマ装置
X-Ray Lithography Mask and Method for Manufacturing the Same
Ion Shower Apparatus

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Books (3)：

わかる機械要素設計
2008
最新の超精密加工・成形技術と部品化プロセス技術
技術情報協会 2001
精密加工実用便覧
日刊工業社 2000

Education (2)：

- 1975 Hokkaido University School of Engineering
- 1975 Hokkaido University Faculty of Engineering Department of Precision Engineering

Professional career (1)：

Doctor of Engineering (Hokkaido University)

Work history (6)：

2017/04 - 2019/03 Hirosaki University Graduate School of Science and Technology
2004/04 - 2017/03 - 弘前大学教授
1975/04 - 2004/03 NTTマイクロシステムインテグレーション研究所主幹研究員
1975 - 2004 Senior Research Engineer, NTT Microsystem
2004 - Professor, Hirosaki University

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Awards (2)：

1998 - 機械振興協会賞
1998 - The prize of Japan society for the Promotion of Machine industry

Association Membership(s) (7)：

精密工学会 , The Electrochemical Society , The American Vacuum Society , Information and Communication Engineers , The Institute of Electronics , The Japan Society of Applied Physics , The Japan Society for Precision Engineering

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