Rchr
J-GLOBAL ID:200901047748868075   Update date: Jul. 16, 2024

HIGASHIWAKI Masataka

ヒガシワキ マサタカ | HIGASHIWAKI Masataka
Affiliation and department:
Job title: Professor
Homepage URL  (1): http://www2.nict.go.jp/green/
Research field  (4): Electronic devices and equipment ,  Electric/electronic material engineering ,  Nano/micro-systems ,  Nanomaterials
Research keywords  (4): Gallium oxide ,  Molecular beam epitaxy (MBE) ,  transistor ,  Gallium nitride
Research theme for competitive and other funds  (9):
  • 2021 - 2024 次世代省エネ型デバイス関連技術の開発・実証事業
  • 2019 - 2022 Formation of directly-bonded interface between gallium oxide and group-IV semiconductor for power device application
  • 2018 - 2021 マイクロ波帯酸化ガリウムトランジスタの研究開発
  • 2014 - 2019 酸化ガリウムパワーデバイス基盤技術の研究開発
  • 2013 - 2015 Pioneering development of fundamental technologies for fabrication of wide bandgap III-group oxide/nitride heterostructures
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Papers (204):
  • Rie Togashi, Ken Goto, Masataka Higashiwaki, Yoshinao Kumagai. Thermodynamic analysis of molecular beam epitaxy of group-III sesquioxides. JAPANESE JOURNAL OF APPLIED PHYSICS. 2023. 62. 5
  • Masataka Higashiwaki. β-Ga2O3 material properties, growth technologies, and devices: a review. AAPPS Bulletin. 2022
  • Rie Togashi, Haruka Ishida, Ken Goto, Masataka Higashiwaki, Yoshinao Kumagai. Thermodynamic analysis of β-Ga2O3 growth by molecular beam epitaxy. Japanese Journal of Applied Physics. 2022
  • Joel B. Varley, Bo Shen, Masataka Higashiwaki. Wide bandgap semiconductor materials and devices. Journal of Applied Physics. 2022
  • Jianbo Liang, Daiki Takatsuki, Masataka Higashiwaki, Yasuo Shimizu, Yutaka Ohno, Yasuyoshi Nagai, Naoteru Shigekawa. Fabrication of beta-Ga2O3/Si heterointerface and characterization of interfacial structures for high-power device applications. JAPANESE JOURNAL OF APPLIED PHYSICS. 2022. 61. SF
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MISC (22):
  • 熊谷 義直, 村上 尚, 倉又 朗人, 東脇 正高. HVPE法による高品質酸化ガリウムエピタキシャル成長技術. 応用物理. 2017. 86. 2. 107-111
  • 東脇 正高, 熊谷 義直, 村上 尚, 倉又 朗人. エネルギーデバイス最前線 酸化ガリウムパワーデバイスの最新技術と実用化への課題. エネルギーデバイス = Energy device. 2016. 3. 6. 43-47
  • 小西 敬太, 上村 崇史, ワン マンホイ, 佐々木 公平, 倉又 朗人, 山腰 茂伸, 東脇 正高. Ga2O3上に堆積したSiO2膜におけるポストアニールの影響 (電子デバイス). 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報. 2016. 116. 158. 11-15
  • ワン マンホイ, 東脇 正高, 佐々木 公平, 倉又 朗人, 山腰 茂伸. 高耐圧ディスプレッション型フィールドプレートGa2O3 MOSFET (電子デバイス研究会 次世代化合物半導体デバイスの機能と応用). 電気学会研究会資料. EDD = The papers of technical meeting on electron devices, IEE Japan. 2016. 2016. 36. 29-33
  • 東脇正高, WONG Man Hoi, 小西敬太, 佐々木公平, 佐々木公平, 後藤健, 後藤健, 野村一城, THIEU Quang Tu, 富樫理恵, et al. State-of-the-art technology on gallium oxide power devices. 電子情報通信学会技術研究報告. 2016. 115. 402(ED2015 112-120). 13-18
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Patents (26):
Books (13):
  • 次世代パワー半導体の開発・評価と実用化
    エヌ・ティー・エス 2022 ISBN:4860437675
  • Wide bandgap semiconductors for power electronics : materials, devices, applications
    Wiley-VCH 2022 ISBN:3527346716
  • 次世代パワー半導体の開発動向と応用展開
    シーエムシー出版 2021 ISBN:9784781316130
  • Ultrawide bandgap semiconductors
    Elsevier 2021 ISBN:9780128228708
  • 次世代パワー半導体デバイス・実装技術の基礎-Siから新材料への新展開- (設計技術シリーズ89)
    科学情報出版株式会社 2021 ISBN:4904774957
more...
Lectures and oral presentations  (48):
  • Novel wide bandgap semiconductor Ga<sub>2</sub>O<sub>3</sub> transistors
    (International Semiconductor Device Research Symposium (ISDRS 2013) 2013)
  • Depletion-mode Ga<sub>2</sub>O<sub>3</sub> MOSFETs on &beta;-Ga<sub>2</sub>O<sub>3</sub> (010) substrates with Si-ion-implanted channel and contact
    (2013 IEEE International Electron Devices Meeting (IEDM 2013) 2013)
  • Structural and electrical properties of Al<sub>2</sub>O<sub>3</sub>/Ga<sub>2</sub>O<sub>3</sub> MOS diode on &beta;-Ga<sub>2</sub>O<sub>3</sub> (010)
    (2013 MRS Fall Meeting & Exhibit 2013)
  • Research and development on Ga<sub>2</sub>O<sub>3</sub> transistors and diodes
    (1st IEEE Workshop on Wide Bandgap Power Devices and Applications (WiPDA 2013) 2013)
  • Research and development on Ga<sub>2</sub>O<sub>3</sub> power devices
    (2013 International Conference on Solid State Devices and Materials (SSDM 2013) 2013)
more...
Education (3):
  • 1996 - 1998 Osaka University Graduate School of Engineering Science
  • 1994 - 1996 Osaka University Graduate School of Engineering Science
  • 1990 - 1994 Osaka University School of Engineering Science
Professional career (1):
  • Ph. D (Engineering) (Osaka University)
Work history (17):
  • 2022/04 - 現在 Osaka Metropolitan University Department of Physics and Electronics Professor
  • 2022/04 - 現在 National Institute of Information and Communications Technology Green ICT Device Laboratory, Koganei Frontier Research Center, Advanced ICT Research Institute Director
  • 2021/05 - 現在 University of Bristol The Center for Device Thermography and Reliability (CDTR) Honorary Professor(兼務)
  • 2016/03 - 現在 (株)ノベルクリスタルテクノロジー 顧問(兼務)
  • 2021/04 - 2022/03 National Institute of Information and Communications Technology Green ICT Device Laboratory, Koganei Frontier Research Center, Advanced ICT Research Institute Director
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Committee career (9):
  • 2021/04 - 現在 一般社団法人ワイドギャップ半導体学会 企画主査
  • 2020/04 - 現在 応用物理学会 先進パワー半導体分科会 幹事
  • 2018 - 現在 Air Force Office of Scientific Research (AFOSR) Multidisciplinary Research Program of the University Research Initiative (MURI), "Gallium Oxide Materials Science and Engineering (GAME)", USA Scientific Advisory Board Member
  • 2016 - 現在 Leibniz Science Campus "Growth and Fundamentals of Oxides for Electronic Applications (GraFOx)", Germany International Advisory Board Member
  • 2013/04 - 現在 電気学会 次世代化合物電子デバイスとその応用調査専門委員会 委員
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Awards (10):
  • 2022/04 - Ichimura Foundation for New Technology The 54th Ichimura Prize in Science for Distinguished Achievement Pioneering research and development on gallium oxide devices
  • 2021/11 - Clarivate Analytics 2021 Highly Cited Researcher
  • 2018/02 - University of California, Santa Barbara Nakamura Lecturer Award
  • 2015/02 - Japan Society of the Promotion of Science The JSPS Award
  • 2013/07 - The 27th Fuji-Sankei Business i Advanced Technology Award Research and development of gallium oxide power devices
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Association Membership(s) (3):
THE INSTITUTE OF ELECTRONICS, INFORMATION AND COMMUNICATION ENGINEERS. ,  IEEE ,  THE JAPAN SOCIETY OF APPLIED PHYSICS
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