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J-GLOBAL ID：200901082359931330   Update date: Nov. 01, 2024

Otani Yohei

オウタニ ヨウヘイ | Otani Yohei
Affiliation and department：
Suwa University of Science Tokyo University of Science, Suwa, Faculty of Engineering, Department of Electrical and Electronic Engineering

About Suwa University of Science Tokyo University of Science, Suwa, Faculty of Engineering, Department of Electrical and Electronic Engineering


Research field  (1)： Electric/electronic material engineering
Research keywords  (1)： Deposition of thin films
Research theme for competitive and other funds  (9)：
  • 2023 - 2026 Investigation of physical structure model of high-k/Ge interface affected by process temperatures
  • 2022 - 2023 Investigation of physical structure model of high-k/Ge interface affected by fabrication processes
  • 2021 - 2022 Investigation of physical structure model of high-k/Ge interface affected by fabrication processes
  • 2020 - 2021 Investigation of physical structure model of high-k/Ge interface affected by fabrication processes
  • 2017 - 2020 Study of the effect of post-deposition processing on various type high-k/Ge structure
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Papers (40)：
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MISC (8)：
  • Hiroshi Okamoto, Daichi Yamada, Hidefumi Narita, Yohei Otani, Chiaya Yamamoto, Junji Yamanaka, Tetsuya Sato, Yukio Fukuda. Effect of postdeposition treatments on the electrical properties of Al2O3/GeO2 gate stack grown on Ge substrate by radical-enhanced atomic layer deposition. Extended abstract of 9th International Workshop on New group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration". 2016. I-04-7-I-04-8
  • Takuro Iwasaki, Toshiro Ono, Yohei Otani, Yukio Fukuda, Hiroshi Okamoto. Interface State Density Evaluation of p-Type and n-Type Ge/GeNx Structures by Conductance Technique. ELECTRONICS AND COMMUNICATIONS IN JAPAN. 2015. 98. 6. 8-15
  • 簗池昴生, 横平知也, 山田大地, 王谷洋平, 柳ビョンハク, 関渓太, 佐藤哲也, 福田幸夫. RE-ALD形成Al2O3/GeO2/p-Geの電気的特性に及ぼす熱処理と酸素ラジカル照射の効果. 応用物理学会第20回ゲートスタック研究会特別報告書. 2015. 193-196
  • 石崎博基, 梁池昂生, 関渓太, 滝澤蓮, 花田毅広, 王谷洋平, 山本千綾, 山中淳二, 佐藤哲也, 福田幸夫. マイクロ波リモートプラズマ-ALD法によるSi基板上のHfO/HfSixOy薄膜の作製および評価. 第18回ゲートスタック研究会 特別研究会研究報告書. 2013. 123-126
  • 梁池昂生, 関渓太, 滝澤蓮, 花田毅広, 石崎博基, 王谷洋平, 佐藤哲也, 福田幸夫. ALD法によりSi(100)基板上に成膜したHfO2薄膜のマイクロ波リモート酸素プラズマ照射による特性改善. 第18回ゲートスタック研究会 特別研究会研究報告書. 2013. 143-146
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Books (2)：
  • 無機材料の表面処理・改質技術と将来展望-金属,セラミックス,ガラス-
    シーエムシー出版 2007 ISBN:9784882316978
  • エレクトロニクス用 セラミックスの製造プロセスと応用技術《大全集》
    技術情報協会 2007
Lectures and oral presentations  (82)：
  • Fabrication and I-V characteristic evaluation of Pt/TiO2/Ge capacitors
    (15th International Workshop on New Group IV Semiconductor Nanoelectronics 2024)
  • Cryogenic oxidation of Si and Ge substrates using Ar/O2 DC discharge plasma irradiation
    (The 85th JSAP Autumn Meeting 2024 2024)
  • Characteristics of thin films deposited on Ge substrates at ultra low temperatures
    (FY 2023 RIEC Annual Meeting on Cooperative Research Projects 2024)
  • Fabrication of Al2O3 film on Ge substrate at 190K and its electrical properties
    (14th International Workshop on New Group IV Semiconductor Nanoelectronics 2023)
  • Electrical Properties of Al2O3 Thin Films Deposited on p-type Ge Substrates
    (The 70th JSAP Spring Meeting 2023 2023)
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Education (2)：
  • - 2006 Nara Institute of Science and Technology Graduate School of Materials Science Material Science
  • - 2001 Kyoto University Faculty of Engineering Industrial Chemistry
Professional career (1)：
  • Doctor(engineering) (Nara Institute of Science and Technology)
Work history (4)：
  • 2008 - 2012 Tokyo University of Science, Suwa Junior Associate Professor
  • 2012 - Tokyo University of Science, Suwa Associate Professor
  • 2007 - 2008 Tokyo University of Science, Suwa Assistant Professor
  • 2006 - 2007 Tokyo University of Science, Suwa Research Associate
Committee career (6)：
  • 2017/06 - 現在 長野県 下諏訪町 まち・ひと・しごと創生有識者会議委員
  • 2013/04 - 現在 茅野市教育委員会 茅野市公民館運営審議会委員
  • 2018/04 - 2022/03 公益社団法人 応用物理学会 代議員
  • 2020/10 - 2021/03 長野県 下諏訪町 下諏訪町総合計画審議会委員
  • 2017/05 - 2020/05 公益社団法人 日本セラミックス協会 協会誌編集委員
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Awards (1)：
  • 2006/09/19 - 日本セラミックス協会第19回秋季シンポジウム 「誘電材料の新展開-ナノ構造制御と新材料設計-」 シンポジウムポスター奨励賞
Association Membership(s) (4)：
MRS-J ,  The Ceramic Society of Japan ,  The Society of Chemical Engineers, Japan ,  The Japan Society of Applied Physics
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