2015 - 2020 GaN Transistors with Three-dimensional Channel Fabricated by Using Selective Area Growth
Papers (46):
Hirohisa Hirai, Yoshinao Miura, Akira Nakajima, Shinsuke Harada, Hiroshi Yamaguchi. Crystal-orientation-dependent flatband voltage of non-polar GaN MOS interfaces investigated using trench sidewall capacitors. APPLIED PHYSICS LETTERS. 2021. 119. 7
Yoshinao Miura, Hirohisa Hirai, Akira Nakajima, Shinsuke Harada. A New JTE Technique for Vertical GaN Power Devices by Conductivity Control Using Boron Implantation into p-Type Layer. 2021 33rd International Symposium on Power Semiconductor Devices and ICs (ISPSD). 2021. 343-346
M. Watanabe, N. Shigyo, T. Hoshii, K. Furukawa, K. Kakushima, K. Satoh, T. Matsudai, T. Saraya, T. Takakura, I. Muneta, et al. Accurate TCAD simulation of trench-gate IGBTs and its application to prediction of carrier lifetime requirements for future scaled devices. 2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021. 2021
平井悠久, 三浦喜直, 中島昭, 原田信介, 山口浩. Crystal face dependence of channel characteristics of GaN UMOS subjected to TMAH treatment. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2021. 68th