Rchr
J-GLOBAL ID:201501077170383603   Update date: Feb. 01, 2024

Hoshii Takuya

ホシイ タクヤ | Hoshii Takuya
Affiliation and department:
Research field  (1): Electronic devices and equipment
Research keywords  (1): Semiconductor device
Research theme for competitive and other funds  (6):
  • 2021 - 2025 高移動度二次元正孔ガスpチャネルGaNトランジスタの開発
  • 2019 - 2023 GaN transited having 3-dimensional channels with various operation modes using selectively grown Fin structures
  • 2015 - 2020 GaN Transistors with Three-dimensional Channel Fabricated by Using Selective Area Growth
  • 2015 - 2019 Development of low-loss buffer layer for fabrication and realization of high-performance optical devices on Si substrates
  • 2014 - 2019 Control of 3D atomic structures of impurities doped in semiconductors and its application to low-loss high efficient devices
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Papers (48):
  • Takamasa Kawanago, Ryosuke Kajikawa, Kazuto Mizutani, Sung-Lin Tsai, Iriya Muneta, Takuya Hoshii, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi. Doping-Free Complementary Metal-Oxide-Semiconductor Inverter Based on N-Type and P-Type Tungsten Diselenide Field-Effect Transistors With Aluminum-Scandium Alloy and Tungsten Oxide for Source/Drain Contact. IEEE Journal of the Electron Devices Society. 2023. 11. 15-21
  • M. Nishizawa, T. Hoshii, H. Wakabayashi, K. Tsutsui, Y. Daigo, I. Mizushima, T. Yoda, K. Kakushima. Minority carrier lifetime extraction methodology based on parallel pn diodes with a field plate. Japanese Journal of Applied Physics. 2022. 61. SH
  • Takamasa Kawanago, Takahiro Matsuzaki, Ryosuke Kajikawa, Iriya Muneta, Takuya Hoshii, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi. Experimental demonstration of high-gain CMOS inverter operation at low V ( dd ) down to 0.5 V consisting of WSe2 n/p FETs. JAPANESE JOURNAL OF APPLIED PHYSICS. 2022. 61. SC
  • M. Watanabe, N. Shigyo, T. Hoshii, K. Furukawa, K. Kakushima, K. Satoh, T. Matsudai, T. Saraya, T. Takakura, I. Muneta, et al. Accurate TCAD simulation of trench-gate IGBTs and its application to prediction of carrier lifetime requirements for future scaled devices. 2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021. 2021
  • T. Saraya, K. Itou, T. Takakura, M. Fukui, S. Suzuki, K. Takeuchi, M. Tsukuda, K. Satoh, T. Matsudai, K. Kakushima, et al. 3.3 kV back-gate-controlled IGBT (BC-IGBT) using manufacturable double-side process technology. Technical Digest - International Electron Devices Meeting, IEDM. 2020. 2020-December. 5.3.1-5.3.4
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MISC (103):
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Patents (3):
Education (3):
  • 2008 - 2011 The University of Tokyo School of Engineering Department of Electrical Engineering and Information Systems
  • 2006 - 2008 The University of Tokyo Graduate School of Frontier Sciences
  • 2002 - 2006 The University of Tokyo Faculty of Engineering Department of Electronic Engineering
Work history (2):
  • 2017/01 - 現在 Tokyo Institute of Technology School of Engineering Assistant Professor
  • 2011/04 - 2016/12 The University of Tokyo Research Center for Advanced Science and Technology Assistant Professor
Committee career (2):
  • 2015/01 - 2018/12 公益社団法人応用物理学会 2015年国際固体素子・材料コンファレンス 論文委員
  • 2012/09 - 2014/07 公益社団法人応用物理学会 分科会 日本光学会 光学シンポジウム 実行委員
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