Research field (4)：
Quantum beam science
, Other
, Electric/electronic material engineering
, Nanomaterials
Research keywords (9)：
Machine learning
, resist
, development
, Electron beam
, Lithography
, Extreme ultraviolet
, Resist
, Radiation chemistry
, Quantum beam
Research theme for competitive and other funds (18)：
2018 - 2023 Development of single nano materials based on quantum beam and data science
2015 - 2018 Influence of charge delocalization in nanofabrication induced by ionizing radiations
2013 - 2018 Study on nanochemistry in latest nanofabrication materials using quantum beams
2010 - 2012 Study on nanoscale chemical reactions and reaction sites using quantum beams
2009 - 2011 Study on the expanse of thermalized electrons in condensed matters
2007 - 2009 Study on nanoscale chemical reaction for the establishment of scientific foundation of ultrafine patterning using extreme ultraviolet radiation
2005 - 2008 Femtosecond Pulse Radiolysis Study on Nanoscale Time Space Reaction Process
2004 - 2006 フェムト秒パルスラジオリシスによる極限ナノビームプロセスの創生
2003 - 2005 Sub-femtosecond/attosecond pulse radiolysis study
2003 - 2005 孤立したナノ構造体・分子素子の電極レス伝導度評価技術の開発
2002 - 2004 Femtosecond pulse radiolysis study on reaction mechanism induced in nanostructures
1999 - 2001 Study on primary processes of radiation chemistry in aqueous solutions using femtosecond quantum multibeams
1997 - 1998 Study of Primary Processes of Radiation Chemistry by using Laser-Synchronized Pulse Radiolysis
1996 - 1996 次世代Xバンド加速によるフェムト秒ライナックの設計
1995 - 1996 Reserch of Ultra-High Gradient Laser-Plasma Accelerator
1995 - 1996 Study on Subpicosecond Radiation Interactions with Materials
1994 - 1994 化学増幅型レジストの放射線誘起反応機構の解明
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Papers (407)：
Takahiro Kozawa. Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography. Journal of Photopolymer Science and Technology. 2024. 37. 1. 129-134
Akihiro Konda, Hiroki Yamamoto, Shusuke Yoshitake, Takahiro Kozawa. Transient Swelling During Development of Poly(methyl methacrylate) Resist. Journal of Photopolymer Science and Technology. 2024. 37. 1. 81-88
Takahiro Kozawa. Design strategy of extreme ultraviolet resists. Japanese Journal of Applied Physics. 2024. 63. 5. 050101-050101
Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto, Shuhei Shimoda, Takahiro KOZAWA. A study on the resist performance of inorganic-organic resist materials for EUV and electron-beam lithography. Japanese Journal of Applied Physics. 2024. 63. 04SP87
Yuko Tsutsui Ito, Kyoko Watanabe, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu. Dissolution dynamics of poly(4-hydroxystyrene) in potassium hydroxide (KOH) and sodium hydroxide (NaOH) aqueous solutions investigated by quartz crystal microbalance (QCM) method. Japanese Journal of Applied Physics. 2024. 63. 4. 046502-046502
Yuqing Jin, Takahiro Kozawa, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, Yasushi Yagi. Chemical information extraction from scanning electron microscopy images on the basis of image recognition. Advances in Patterning Materials and Processes XL. 2023. 12498. 1249825
重政凌亮, SUGIANTO Wildatus Sa’diyah, 植竹裕太, 植竹裕太, 室屋裕佐, 古澤孝弘, 櫻井英博, 櫻井英博. Preparation of base metal nanoparticles using fullerenol as a surfactant. 日本化学会春季年会講演予稿集(Web). 2023. 103rd
高田結以, 室屋裕佐, 古澤孝弘, 榎本智至, NAQVI Bilal, DE DANILO Simone. Study on radiation-induced reaction mechanism of EUV resist containing Sn. 日本原子力学会秋の大会予稿集(CD-ROM). 2022. 2022
山本洋揮, 古澤孝弘. Mask production for Extreme Ultraviolet (EUV) Lithography on Au nanopatterns. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2022. 83rd
室屋裕佐, 和田陽一, 石田一成, 清水亮介, 古澤孝弘. Track diffusion model simulation study on primary processes of neutron radiolysis of water at high temperatures. 放射線化学討論会講演要旨集. 2022. 65th (CD-ROM)
