Art

J-GLOBAL ID：200902122327403028   Reference number：02A0616914

The Design of Resist Materials for 157nm Lithography.

157nmリソグラフィー用のレジスト材料の設計

Author (9)： WILLSON C G (Univ. Texas at Austin, TX) ,  TRINQUE B C (Univ. Texas at Austin, TX) ,  OSBORN B P (Univ. Texas at Austin, TX) ,  CHAMBERS C R (Univ. Texas at Austin, TX) ,  HSIEH Y-T (Univ. Texas at Austin, TX) ,  CHIBA T (Univ. Texas at Austin, TX) ,  ZIMMERMAN P (International SEMATECH, TX) ,  MILLER D (International SEMATECH, TX) ,  CONLEY W (International SEMATECH, TX)
Material： Journal of Photopolymer Science and Technology  (フォトポリマー懇話会誌)
Volume： 15  Issue： 4  Page： 583-590  Publication year： 2002 
JST Material Number： L0202A  ISSN： 0914-9244  CODEN： JSTEEW  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： vacuum ultraviolet radiation ,...
Semi thesaurus term： ポジ型レジスト

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JST classification (2)： Manufacturing technology of solid-state devices  (NC03030V) ,  Aliphatic halogen compounds  (CF03050P)

Substance index (6)： 3-(Trifluoromethyl)tricyclo[4.2.1.0^2,5]nona-7-ene-3-carboxylic acid tert-butyl ester ,  α,α-Bis(trifluoromethyl)norborna-5-ene-2-ethanol ,  5-(Trifluoromethyl)bicyclo[2.2.1]hepta-2-ene-5-ol ,  5-(Trifluoromethyl)bicyclo[2.2.1]hepta-2-ene-5-carboxylic acid ethoxymethyl ester ,  2-(Trifluoromethyl)acrylic acid 1-[4-[1-(trifluoromethyl)-2,2,2-trifluoro-1-hydroxyethyl]cyclohexyl]-1-(trifluoromethyl)-2,2,2-trifluoroethyl ester ,  3,3-Difluoro-2-(trifluoromethyl)bicyclo[2.2.1]hepta-5-ene-2-ol

Reference (9)：

• 1) Tran, H. V.; Hung, R. J.; Chiba, T.; Yamada, S.; Mrozek, T.; Hsieh, Y.-T.; Chambers, C. R.; Osborn, B. P.; Trinque, B. C.; Pinnow, M. J.; Sanders, D. P.; Connor, E. F.; Grubbs, R. H.; Conley, W.; MacDonald, S. A.; Willson, C. G. Journal of Photopolymer Science and Technology 2001, 14, 669-674.
• 2) Kunz, R. R. B., T.M.; Hardy, D.E.; Goodman, R.B.; Downs, D.K.; Curtin, J.E. Proc. SPIE-Int. Soc. Opt. Eng. 1999, 3678,13-20.
• 3) Hung, R. J.-P.; Tran, H. V.; Trinque, B. C.; Chiba, T.; Yamada, S.; Sanders, D.; Connor, E. F.; Grubbs, R. H.; Klopp, J. M.; Frechet, J. M. J.; Thomas, B. H.; Shafer, G. J.; DesMarteau, D. D.; Conley, W.; Grant, W. C. Proc. SPIE-Int. Soc. Opt. Eng. 2001, 4345, 385-395.
• 4) Bae, Y. C.; Douki, K.; Yu, T.; Dai, J.; Schmaljohann, D.; Kang, S. H.; Kim, K. H.; Koerner, H.; Conley, W.; Miller, D.; Balasubramanian, R.; Holl, S.; Ober, C. K. Journal of Photopolymer Science and Technology 2001, 14, 613-620.
• 5) Brodsky, C.; Byers, J.; Conley, W.; Hung, R.; Yamada, S.; Patterson, K.; Somervell, M.; Trinque, B.; Tran, H. V.; Cho, S.; Chiba, T.; Lin, S.-H.; Jamieson, A.; Johnson, H.; Vander Heyden, T.; Willson, C. G. J. Vac. Sci. Technol., B 2000, 18, 3396-3401.

Terms in the title (3)： リソグラフィー ,  レジスト材料 ,  設計