Art
J-GLOBAL ID:200902127710632849   Reference number:02A0616916

New Strategies for High Resolution Photoresists.

高分解能フォトレジストのための新しい戦略
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Volume: 15  Issue:Page: 603-611  Publication year: 2002 
JST Material Number: L0202A  ISSN: 0914-9244  CODEN: JSTEEW  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices  ,  Copolymerization 
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