Art
J-GLOBAL ID:201802231001130947   Reference number:18A2161639

Comparing high-purity c- and m-plane GaN layers for Schottky barrier diodes grown homoepitaxially by metalorganic vapor phase epitaxy

有機金属気相エピタクシーによりホモエピタキシャル成長させたSchottky障壁ダイオードのための高純度c面およびm面GaN層の比較
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Volume: 57  Issue: 10  Page: 105501.1-105501.6  Publication year: Oct. 2018 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Semiconductor thin films 

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