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Affiliation and department：
Job title： Professor
Research theme for competitive and other funds (4)：
Papers (25)：
MISC (19)：
Books (10)：
Works (1)：
Association Membership(s) (2)：
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Tokyo National College of Technology Department of General Subjects
About Tokyo National College of Technology Department of General Subjects
Job title： Professor
Research theme for competitive and other funds (4)：
- 環境配慮型薄膜材料に関する研究
- 極低エネルギーイオンビームを用いた炭素薄膜形成に関する研究
- Study on Gowth of compound semiconductor thin film
- Study on growth of carbon thin film by ultra-low energy ion beam deposition.
- S. Fujii, H. Ohno. Introduction of trinity of science: physics, experiment and mathematics for international students. 2019. 149-154
- T. Ichinohe, H.Ohno. Non-doped titanium oxide films for transparent conductive oxides fabricated by plasma-assisted deposition. 2019. 62. 7. 406-410
- 大野 秀樹. 放射線教育の充実に向けた取り組み. 東京工業高等専門学校研究報告書 46(1), pp.1-8. 2014
- 大野 秀樹. 好奇心をはぐくむ物理実験教室. 東京工業高等専門学校研究報告書 42(2), pp.49-51. 2011
- Shiroishi Hidenobu, Ohno Hideki, Matsumoto Akiyo. Hidden Risks Involved in Class Questionnaires -The Relationship between Student Needs and Class Questionnaires -. Japanese colleges of technology education journal. 2010. 33. 359-264
- Y Honda, M Takei, H Ohno, S Shida, K Goda. Light-emitting Si films formed by neutral cluster deposition in a thin O-2 gas. JOURNAL OF LUMINESCENCE. 2005. 113. 3-4. 279-284
- M Nakamura, H Ohno, S Murakami. Formation of the 1.014 eV photoluminescence Cu center in Cu-implanted silicon crystals and the center's model. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS. 2004. 43. 11B. L1466-L1468
- M Nakamura, H Ohno, S Murakami. Formation of the 1.014 eV photoluminescence Cu center in Cu-implanted silicon crystals and the center's model. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS. 2004. 43. 11B. L1466-L1468
- JA Van den Berg, DG Armour, S Zhang, S Whelan, H Ohno, TS Wang, AG Cullis, EHJ Collart, RD Goldberg, P Bailey, et al. Characterization by medium energy ion scattering of damage and dopant profiles produced by ultrashallow B and As implants into Si at different temperatures. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2002. 20. 3. 974-983
- RD Goldberg, DG Armour, JA van den Berg, CEA Cook, S Whelan, S Zhang, N Knorr, MA Foad, H Ohno. The production and use of ultralow energy ion beams. REVIEW OF SCIENTIFIC INSTRUMENTS. 2000. 71. 2. 1032-1035
- ビジュアルアプローチ 基礎物理問題集
森北出版 2013 - ビジュアルアプローチ 基礎物理(下巻)
森北出版 2013 - ビジュアルアプローチ 基礎物理(上巻)
森北出版 2013 - 高専テキストシリーズ 物理問題集
森北出版 2013 - 高専テキストシリーズ 物理(下巻)
森北出版 2013
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