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J-GLOBAL ID:200901098950845463   Update date: Jan. 31, 2024

Matsuo Jiro

マツオ ジロウ | Matsuo Jiro
Affiliation and department:
Job title: Associate Professor,Associate Professor
Research field  (1): Electronic devices and equipment
Research keywords  (6): 先端分析技術 ,  表面衝突 ,  イオンビーム ,  material analysis ,  surface collision ,  ion beam
Research theme for competitive and other funds  (19):
  • 2017 - 2021 Ambient SIMS Technique for Liquid-Solid Interface Analysis
  • 2014 - 2017 Development of direct visualization methods of steroid hormones on tissue sections by imaging mass spectrometry..
  • 2011 - 2014 Development of analytical technique for organic materials with massive cluster ion beams
  • 2010 - 2011 Development of femto-second X-ray source
  • 2004 - 2006 PRECISE MEASUREMENTS OF SECONDARY ELECTRONS AND IONS PRODUCED IN COLLISIONS BETWEEN FAST PROJECTILE IONS AND LIQUID MOLECULAR JET TARGETS
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Papers (264):
  • 松尾 二郎. SIMS 測定のためのプラス α の研究技術. 応用物理. 2023. 92. 4. 235-239
  • Toshio Seki, Hiroki Yamamoto, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo. High aspect (>20) etching with reactive gas cluster injection. JAPANESE JOURNAL OF APPLIED PHYSICS. 2022. 61. SI. ARTN SI1007
  • Masaki Hada, Satoshi Ohmura, Tadahiko Ishikawa, Masaki Saigo, Naoya Keio, Wataru Yajima, Tatsuya Suzuki, Daisuke Urushihara, Kou Takubo, Yusuke Masaki, et al. Photoinduced oxygen transport in cobalt double-perovskite crystal EuBaCo2O5.39. APPLIED MATERIALS TODAY. 2021. 24. ARTN 101167
  • Masaki Hada, Kotaro Makino, Hirotaka Inoue, Taisuke Hasegawa, Hideki Masuda, Hiroo Suzuki, Keiichi Shirasu, Tomohiro Nakagawa, Toshio Seki, Jiro Matsuo, et al. Phonon transport probed at carbon nanotube yarn/sheet boundaries by ultrafast structural dynamics. CARBON. 2020. 170. 165-173
  • Toshio Seki, Tomoya Nonomura, Takaaki Aoki, Jiro Matsuo. MeV-SIMS measurement of lithium-containing electrolyte. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS. 2020. 479. 229-232
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MISC (145):
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Books (34):
  • Ultra-Hard DLC formation at low temperture by gas cluster in beam assisted deposition
    Mass and Change transprt in inorganic matcrials,/,957-964 2000
  • Clustor size Measurment of Large Ar Cluster Ins with Time of Flight
    IEEE, Proc. of the 12th International Canferencecn Im Implantation Technology,/,1234-1237 1999
  • AIP, Application of Cluster In Implantation Micro electronic Devices
    AIP, Application of Accelaratars in Research and Industry,/,379-382 1999
  • Borm Diffusiun in Ultra Low Enery Decaboranc Im Implantation
    IEEE, Proc, of the 12th International Canferencecn Im Implantation Technology,/,1258-1261 1999
  • Monte Curlo Simolation of Surfaces Smoothing Effect by Closter Ions
    IEEE, Proc. of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1230-1233 1999
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Works (1):
  • クラスターイオンビームプロセスの研究
    2000 -
Education (2):
  • - 1984 Kyoto University
  • - 1984 Kyoto University Faculty of Electro Communications
Professional career (1):
  • (BLANK) (Kyoto University)
Association Membership(s) (3):
米国真空学会(American Vaccum Society) ,  日本物理学会 ,  応用物理学会
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