Rchr
J-GLOBAL ID:200901098950845463
Update date: Aug. 17, 2024
Matsuo Jiro
マツオ ジロウ | Matsuo Jiro
Affiliation and department:
Job title:
Associate Professor,Associate Professor
Research field (1):
Electronic devices and equipment
Research keywords (6):
先端分析技術
, 表面衝突
, イオンビーム
, material analysis
, surface collision
, ion beam
Research theme for competitive and other funds (19):
- 2017 - 2021 Ambient SIMS Technique for Liquid-Solid Interface Analysis
- 2014 - 2017 Development of direct visualization methods of steroid hormones on tissue sections by imaging mass spectrometry..
- 2011 - 2014 Development of analytical technique for organic materials with massive cluster ion beams
- 2010 - 2011 Development of femto-second X-ray source
- 2004 - 2006 PRECISE MEASUREMENTS OF SECONDARY ELECTRONS AND IONS PRODUCED IN COLLISIONS BETWEEN FAST PROJECTILE IONS AND LIQUID MOLECULAR JET TARGETS
- 2002 - 2003 Study of Cluster Ion Analysis method?
- 2000 - 2001 Study on high quality oxide formation
- 1998 - 2000 A STUDY ON ULTRA-HARD FILM FORMATION BY MACROPARTICLE ION BEAM WITH HIGH ENERGY
- 1997 - 1999 Nonlinear Phenomena in Cluster Ion impact on Solid Surfaces
- 1997 - 1997 ガスクラスターイオンビームと固体表面との反応素過程に関する研究
- 1996 - 1997 SURFACE MODIFICATION BY HIGH INTENSITY ION BEAM IRRADIATION
- 1996 - 1996 ガスクラスターイオンビームと固体表面との反応素過程に関する研究
- 1995 - 1995 ガスクラスターイオンビームと固体表面との反応素過程に関する研究
- 1992 - 1994 Study on development of cluster ion implantation system for LSI
- 1992 - 1994 Study on epitaxial metal/insulator multilayr structure formation
- クラスターイオンビームプロセスの研究
- 高速粒子の表面衝突ダイナミクスの研究
- Study on Cluster Ion Beam Processing
- Collision Dynamics of Hyper-thormal Particles on Solid Surfaces
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Papers (269):
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松尾 二郎. SIMS 測定のためのプラス α の研究技術. 応用物理. 2023. 92. 4. 235-239
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Toshio Seki, Hiroki Yamamoto, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo. High aspect (>20) etching with reactive gas cluster injection. JAPANESE JOURNAL OF APPLIED PHYSICS. 2022. 61. SI. ARTN SI1007
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Masaki Hada, Satoshi Ohmura, Tadahiko Ishikawa, Masaki Saigo, Naoya Keio, Wataru Yajima, Tatsuya Suzuki, Daisuke Urushihara, Kou Takubo, Yusuke Masaki, et al. Photoinduced oxygen transport in cobalt double-perovskite crystal EuBaCo2O5.39. APPLIED MATERIALS TODAY. 2021. 24. ARTN 101167
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Masaki Hada, Kotaro Makino, Hirotaka Inoue, Taisuke Hasegawa, Hideki Masuda, Hiroo Suzuki, Keiichi Shirasu, Tomohiro Nakagawa, Toshio Seki, Jiro Matsuo, et al. Phonon transport probed at carbon nanotube yarn/sheet boundaries by ultrafast structural dynamics. CARBON. 2020. 170. 165-173
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Toshio Seki, Tomoya Nonomura, Takaaki Aoki, Jiro Matsuo. MeV-SIMS measurement of lithium-containing electrolyte. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS. 2020. 479. 229-232
more...
MISC (145):
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K. Tsutsui, B. Z. Li, I. Mizushima, H. Wakabayashi, K. Suguro, J. Matsuo, Y. L. Jinag, T. Skotnicki, K. Ohuchi, S. Shibata, et al. Preface. 15th International Workshop on Junction Technology, IWJT 2015. 2016
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Development of ambient SIMS using MeV-energy ion probe. Annual report of Quantum Science and Engineering Center. 2016. 18. 21-25
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Development of Low-Vacuum SIMS Instruments with Large Cluster Ion Beam. Annual report of Quantum Science and Engineering Center. 2016. 18. 26-29
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3D molecular imaging of organic multilayer film by Ar gas cluster ion beam SIMS. Annual report of Quantum Science and Engineering Center. 2014. 16. 27-29
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Lipid Compounds Analysis with MeV-SIMS Apparatus. Annual report of Quantum Science and Engineering Center. 2014. 16. 22-24
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Books (34):
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Ultra-Hard DLC formation at low temperture by gas cluster in beam assisted deposition
Mass and Change transprt in inorganic matcrials,/,957-964 2000
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Clustor size Measurment of Large Ar Cluster Ins with Time of Flight
IEEE, Proc. of the 12th International Canferencecn Im Implantation Technology,/,1234-1237 1999
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AIP, Application of Cluster In Implantation Micro electronic Devices
AIP, Application of Accelaratars in Research and Industry,/,379-382 1999
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Borm Diffusiun in Ultra Low Enery Decaboranc Im Implantation
IEEE, Proc, of the 12th International Canferencecn Im Implantation Technology,/,1258-1261 1999
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Monte Curlo Simolation of Surfaces Smoothing Effect by Closter Ions
IEEE, Proc. of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1230-1233 1999
more...
Works (1):
-
クラスターイオンビームプロセスの研究
2000 -
Education (2):
- - 1984 Kyoto University
- - 1984 Kyoto University Faculty of Electro Communications
Professional career (1):
- (BLANK) (Kyoto University)
Association Membership(s) (3):
米国真空学会(American Vaccum Society)
, 日本物理学会
, 応用物理学会
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