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J-GLOBAL ID：200902137891039066
Reference number：02A0849332 high-k/SiO2/Si構造のフォトレフレクタンス評価
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SAMUKAWA MASAYUKI
About SAMUKAWA MASAYUKI
(大阪大 基礎工)
, About 大阪大 基礎工
KANDA HIROFUMI
About KANDA HIROFUMI
(大阪大 基礎工)
, About 大阪大 基礎工
KANASHIMA TAKESHI
About KANASHIMA TAKESHI
(大阪大 基礎工)
, About 大阪大 基礎工
FUJIMOTO AKIRA
About FUJIMOTO AKIRA
(和歌山工高専)
, OKUYAMA MASANORI
About OKUYAMA MASANORI
(大阪大 基礎工)
About 大阪大 基礎工
Material：
応用物理学会学術講演会講演予稿集
(Extended Abstracts. Annual Meeting. Japan Society of Applied Physics)
About 応用物理学会学術講演会講演予稿集
Volume： 63rd Issue： 2 Page： 710 Publication year： Sep. 24, 2002
JST Material Number： Y0055A Document type： Proceedings
Article type： 短報 Country of issue： Japan (JPN) Language： JAPANESE (JA)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*silicon dioxide
,...
About silicon dioxide
JST classification (2)：
JST classification
Category name(code) classified by JST.
Oxide thin films
Category name(code) classified by JST.
(BK14050P)
, Other optical effects
About Oxide thin films
(BM08040H)
About Other optical effects
Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
Keywords automatically extracted from the title.
SiO2
, About SiO2
Si
, About Si
フォト
, About フォト
レフレクタンス
, About レフレクタンス
評価
About 評価
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