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J-GLOBAL ID:200902151319072489   Reference number:01A0078752

Chemical Vapor Deposition Based Preparation on Porous Silica Films.

多孔質シリカ膜のCVD法による作製
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Material:
Volume: 39  Issue: 11B  Page: L1155-L1157  Publication year: Nov. 15, 2000 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Oxide thin films 
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