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J-GLOBAL ID：200902164362454322
Reference number：96A0263380 Ionized Cluster Beam Technology for Material Science.
クラスターイオンビームと材料科学
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TAKAGI TOSHINORI
About TAKAGI TOSHINORI
(イオン工学研)
About イオン工学研
Material：
表面科学
(JSSSJ)
Volume： 17 Issue： 2 Page： 81-89 Publication year： Feb. 1996
JST Material Number： F0940B ISSN： 0388-5321 Document type： Article
Article type： 解説 Country of issue： Japan (JPN) Language： JAPANESE (JA)
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On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
ion beam deposition
,...
About ion beam deposition
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On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
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On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
ion effect
About ion effect
JST classification (2)：
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Techniques and equipment of thin film deposition
Category name(code) classified by JST.
(BK14020I)
, Manufacturing technology of solid-state devices
About Techniques and equipment of thin film deposition
(NC03030V)
About Manufacturing technology of solid-state devices
Reference (48)：
- 高木俊宜. 応用物理. 1984, 53, 695
- 高木俊宜. 応用物理. 1982, 51, 1070
- TAKAGI, T. Thin Solid Films. 1982, 92
- 高木俊宜. 日経エレクトロニクス. 1981, 279, 188
- 高木俊宜. 化学と工業. 1982, 35, 848
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クラスターイオンビーム
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材料科学
About 材料科学
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