Art
J-GLOBAL ID:200902256201752783   Reference number:08A0657819

Extreme Ultraviolet Lithography Simulation by Tracing Photoelectron Trajectories in Resist

レジスト中の光電子飛跡追跡による極端紫外線リソグラフィーのシミュレーション
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Material:
Volume: 47  Issue: 6 Issue 2  Page: 4944-4949  Publication year: Jun. 25, 2008 
JST Material Number: G0520B  ISSN: 0021-4922  CODEN: JJAPB6  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices 

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