Art

J-GLOBAL ID：201802226522708899   Reference number：18A1261016

Damage-free highly efficient polishing of single-crystal diamond wafer by plasma-assisted polishing

プラズマ支援研磨による単結晶ダイヤモンドウエハの無損傷高効率研磨【JST・京大機械翻訳】

Author (9)： Yamamura K. (Division of Precision Science & Technology and Applied Physics, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, Japan) ,  Yamamura K. (Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, Japan) ,  Emori K. (Division of Precision Science & Technology and Applied Physics, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, Japan) ,  Sun R. (Division of Precision Science & Technology and Applied Physics, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, Japan) ,  Ohkubo Y. (Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, Japan) ,  Endo K. (Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, Japan) ,  Yamada H. (Advanced Power Electronics Research Center, Department of Energy and Environment, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Japan) ,  Chayahara A. (Advanced Power Electronics Research Center, Department of Energy and Environment, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Japan) ,  Mokuno Y. (Advanced Power Electronics Research Center, Department of Energy and Environment, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Japan)
Material： CIRP Annals. Manufacturing Technology  (Berichte der Internationale Akademie fuer Produktionstechnik)
Volume： 67  Issue： 1  Page： 353-356  Publication year： 2018 
JST Material Number： E0026A  ISSN： 0007-8506  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)

Abstract/Point： Single-crystal diamond (SCD) i...

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Thesaurus term： completeness ,  *polishing(machining) ,  abrasive compound ,  *single crystal ,  residual stress ,  chemical vapor deposition ,  *plasma ,  Raman spectroscopy
Semi thesaurus term： 研磨速度 ,  パワーデバイス ,  高効率 ,  *単結晶ダイアモンド , 【Automatic Indexing@JST】

Author keywords (3)： Polishing ,  Single crystal ,  Surface integrity

JST classification (1)： Grinding  (QC03000R)

Terms in the title (7)： プラズマ ,  支援 ,  研磨 ,  単結晶ダイヤモンド ,  ウエハ ,  損傷 ,  高効率