Hideo Aida, Toshiro Doi, Yasuhisa Sano, Syuhei Kurokawa. Plasma fusion chemical mechanical polishing as a next generation processing technology and its applications to SiC, GaN, and diamond substrates. Advanced Micro-Fabrication and Green Technology. 2017. 5. -. 70-75
High Efficiency Surface Planarization of Single Crystal Diamond Substrate by Plasma Fusion Chemical Mechanical Polishing
(The 11th Asian-European International Conference on Plasma Surface Engineering 2017)
Fabrication of freestanding heteroepitaxial diamond substrate via micropatterns and microneedles
(応用物理学会秋季学術講演会 2017)