Nishinaka Hiroyuki

Affiliation and department：

Research field (2)： Electronic devices and equipment , Crystal engineering

Research keywords (4)： Oxide thin films , CVD , Epitaxial growth , Crystal growth

Research theme for competitive and other funds (8)：

2023 - 2025 細胞外電子伝達菌と光半導体による高効率人工光合成への挑戦
2022 - 2025 Research of ultra-low power switching devices based on ferroelectric kappa-Ga2O3
2019 - 2022 Research on Polarization-Controlled Ultra-Wide Bandgap Semiconductor Devices
2019 - 2021 Hetero-junction devices of lattice matched alpha-(In1-xAlx)2O3 semiconductors
2019 - 2020 3次元構造への高速被膜技術の開発

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Papers (80)：

Keisuke Watanabe, Hiroyuki Nishinaka, Yuuya Nishioka, Kousuke Imai, Kazutaka Kanegae, Masahiro Yoshimoto. The deposition and the optical characteristics of Cu-based metal halide Cs3Cu2I5 thin film via mist deposition. Japanese Journal of Applied Physics. 2024. 63. 5
Masahiro Kaneko, Hiroyuki Nishinaka, Masahiro Yoshimoto. Crystallographic and band structure analysis of β-(AlxGa1-x)2O3/β-(InyGa1-y)2O3 thin film grown on β-Ga2O3 substrate via mist CVD. AIP Advances. 2024. 14. 4
Kazuki Shimazoe, Hiroyuki Nishinaka, Masahiro Yoshimoto. Heteroepitaxial growth of a-, m-, and r-plane α-Ga2O3 thin films on rh-ITO electrodes for vertical device applications. Journal of Crystal Growth. 2024. 630
Yoko Taniguchi, Hiroyuki Nishinaka, Kazuki Shimazoe, Toshiyuki Kawaharamura, Kazutaka Kanegae, Masahiro Yoshimoto. Visible-light absorption of indium oxide thin films via Bi³⁺ doping for visible-light-responsive photocatalysis. Materials Chemistry and Physics. 2024. 315. 128961
Taisei Kano, Hiroyuki Nishinaka, Yuta Arata, Masahiro Yoshimoto. Nitrogen Doping in VO2 Thin Films on Synthetic Mica Substrates Through Mist Chemical Vapor Deposition: Lowering the Metal-Insulator Transition Temperature Toward Smart Windows. Advanced Materials Interfaces. 2024

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MISC (16)：

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Patents (76)：

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Lectures and oral presentations (84)：

ワイドバンドギャップ半導体の点欠陥の定量
(第16回ナノ構造・エピタキシャル成長講演 2024)
貧溶媒アシスト結晶化法によるCs-Cu-I系のマイクロロッド単結晶成長と物性評価
(応用物理学会関西支部2024年度第1回講演会 2024)
ミストデポジション法によるCs-Cu-I系発光材料の薄膜形成と物性評価
(応用物理学会関西支部2024年度第1回講演会 2024)
Atmospheric Mist CVD Growth of C Doped HfO Thin Films Exhibiting CeRAM Switching
(応用物理学会関西支部2024年度第1回講演会 2024)
モット転移を用いたCeRAMに向けたミストCVDによるNiO薄膜形成と電流電圧特性評価
(応用物理学会関西支部2024年度第1回講演会 2024)

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Professional career (1)：

Work history (5)：

2020/02 - 現在 Kyoto Institute of Technology Faculty of Electrical Engineering and Electronics Associate Professor
2023/08 - 2023/10 University of Colorado Colorado Springs Visiting Scholor
2023/04 - 2023/05 University of Valencia Visiting Scholor
2015/01 - 2020/01 京都工芸繊維大学 Faculty of Electrical Engineering and Electronics Assistant Professor
2009/04 - 2014/12 SHARP Corporation

Awards (6)：

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Association Membership(s) (4)：

IEEE , THE SOCIETY OF MATERIALS SCIENCE, JAPAN , THE JAPAN SOCIETY OF APPLIED PHYSICS , American Chemical Society

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