Rchr
J-GLOBAL ID:202001015760555634   Update date: Apr. 19, 2024

Setsuhara Yuichi

セツハラ ユウイチ | Setsuhara Yuichi
Affiliation and department:
Homepage URL  (1): http://www.jwri.osaka-u.ac.jp/research/research01_2.html
Research field  (1): Thin-film surfaces and interfaces
Research keywords  (4): プラズマエレクトロニクス ,  プラズマ理工学 ,  非平衡材料プロセス ,  表界面制御
Research theme for competitive and other funds  (30):
  • 2021 - 2025 高密度プラズマ支援製膜によるナノ構造制御次世代酸化物半導体薄膜低温形成法の創成
  • 2016 - 2020 Development of advanced reactive plasma-enhanced processes for low-temperature large-area formation of next-generation oxide semiconductor devices
  • 2017 - 2018 Plasma Science Innovation
  • 2014 - 2017 Development of deposition technology of surface nano-structure-controlled ZnO thin films using atmospheric pressure non-equilibrium plasma
  • 2012 - 2017 Development of novel plasma sources for plasma medicine through advanced spatio-temporal control of atmospheric-pressure discharge
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Papers (256):
  • Kosuke Takenaka, Hibiki Komatsu, Taichi Sagano, Keisuke Ide, Susumu Toko, Takayoshi Katase, Toshio Kamiya, Yuichi Setsuhara. Hydrogen-included plasma-assisted reactive sputtering for conductivity control of ultra-wide bandgap amorphous gallium oxide. Japanese Journal of Applied Physics. 2024. 63. 4. 04SP65-04SP65
  • Susumu Toko, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara. Improving the efficiency of CO2 methanation using a combination of plasma and molecular sieves. Results in Surfaces and Interfaces. 2024. 100204-100204
  • Kosuke Takenaka, Shota Nunomura, Yuji Hayashi, Hibiki Komatsu, Susumu Toko, Hitoshi Tampo, Yuichi Setsuhara. Stability and gap states of amorphous In-Ga-Zn-Ox thin film transistors: Impact of sputtering configuration and post-annealing on device performance. Thin Solid Films. 2024. 790. 140203-140203
  • Susumu TOKO, Takamasa OKUMURA, Kunihiro KAMATAKI, Kosuke TAKENAKA, Kazunori KOGA, Masaharu SHIRATANI, Yuichi SETSUHARA. プラズマ触媒作用を用いた二酸化炭素還元反応の促進に関する基礎研究. Journal of Smart Processing. 2024. 13. 1. 31-36
  • Kosuke Takenaka, Akiya Jinda, Soutaro Nakamoto, Ryosuke Koyari, Susumu Toko, Giichiro Uchida, Yuichi Setsuhara. Influence of pre-treatment using non-thermal atmospheric pressure plasma jet on aluminum alloy A1050 to PEEK direct joining with hot-pressing process. The International Journal of Advanced Manufacturing Technology. 2023. 130. 3-4. 1925-1933
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MISC (74):
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Patents (86):
Books (11):
  • Novel Structured Metallic and Inorganic Materials
    Springer 2019 ISBN:9789811376108
  • Plasma Medical Science
    Elsevier 2018 ISBN:9780128150047
  • Comprehensive Materials Processing
    Elsevier 2014 ISBN:9780080965321
  • Справочник по технологии наночастиц ( Nanoparticle Technology Handbook )
    Научный мир ( Scientific World Publishing House ) 2013 ISBN:9785915222310
  • Progress in Advanced Structural and Functional Materials Design
    Springer 2013 ISBN:9784431540632
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Lectures and oral presentations  (92):
  • Low-temperature Formation of High-Mobility In GaZnOx Thin-Film Transistors by Plasma-Enhanced Reactive Processes
    (7th Global Nanotechnology Congress and Expo 2019)
  • Reactive plasma processes for formation of high-mobility IGZO thin-film transistors
    (21st International Conference on Advanced Energy Materials and Research 2019)
  • Low-temperature formation of high-mobility InGaZnOx thin film transistor by ICP-enhanced reactive plasma processes Yuichi Setsuhara
    (The 15th International Symposium on Sputtering and Plasma Processes (ISSP2019) 2019)
  • ICP-Enhanced Reactive Plasma Processes for Low-Temperature Formation of High-Mobility Oxide Semiconductor TFT
    (The 5th Asian Workshop on Applied Plasma Science and Engineering 2019 (APSE2019) 2019)
  • 低ダメージ大面積プロセス対応プラズマ生成・制御技術の開発
    (2018年度フロンティア材料研究所学術賞受賞記念講演会・若手教員講演会 2018)
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Education (3):
  • 1988 - 1991 Osaka University Graduate School, Division of Engineering 電気工学専攻
  • 1986 - 1988 Osaka University Graduate School, Division of Engineering 電磁エネルギー工学専攻
  • 1982 - 1986 Osaka University Faculty of Engineering 電気工学科
Professional career (1):
  • 工学博士 (大阪大学)
Work history (6):
  • 2004/07 - 現在 Osaka University Joining and Welding Research Institute
  • 2001/06 - 2004/06 Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics
  • 1996/05 - 2001/05 Osaka University Joining and Welding Research Institute
  • 1997/04 - 1999/03 通産省工業技術院 名古屋工業技術研究所 流動研究員併任
  • 1997/02 - 1997/02 国際協力事業団 個別専門家委嘱
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Awards (11):
  • 2018/09 - フロンティア材料研究所 フロンティア材料研究所学術賞
  • 2017/03 - ISPlasma2017/IC-PLANTS2017 Best presentation award
  • 2016/09 - 6th International Conference on Plasma Medicine Participants' Poster Prize
  • 2015/09 - 応用物理学会 2015年応用物理学会秋季学術講演会 Poster Award
  • 2012/03 - グローバルCOE プログラム「構造・機能先進材料デザイン教育研究拠点」 第5回グローバルCOE プログラム「構造・機能先進材料デザイン教育研究拠点」シンポジウム最優秀ポスター賞
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Association Membership(s) (7):
日本MRS ,  日本真空学会 ,  溶接学会 ,  日本航空宇宙学会 ,  表面技術協会 ,  応用物理学会 ,  スマートプロセス学会
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