Rchr

J-GLOBAL ID：202001015760555634 Update date: Sep. 07, 2024

Setsuhara Yuichi

セツハラユウイチ | Setsuhara Yuichi

Affiliation and department：
Homepage URL (1)： http://www.jwri.osaka-u.ac.jp/research/research01_2.html

Research field (1)： Thin-film surfaces and interfaces

Research keywords (4)：プラズマエレクトロニクス , プラズマ理工学 , 非平衡材料プロセス , 表界面制御

Research theme for competitive and other funds (30)：

2021 - 2025 高密度プラズマ支援製膜によるナノ構造制御次世代酸化物半導体薄膜低温形成法の創成
2016 - 2020 Development of advanced reactive plasma-enhanced processes for low-temperature large-area formation of next-generation oxide semiconductor devices
2017 - 2018 Plasma Science Innovation
2014 - 2017 Development of deposition technology of surface nano-structure-controlled ZnO thin films using atmospheric pressure non-equilibrium plasma
2012 - 2017 Development of novel plasma sources for plasma medicine through advanced spatio-temporal control of atmospheric-pressure discharge

2012 - 2017 Plasma Medical Science Innovation

2014 - 2016 Development of novel atomic-layer-deposition plasma PVD processes for efficient and high-rate reactive film-formation processes

2011 - 2014 Development of novel plasma-enhanced processes for low-temperature formation of high quality oxide semiconductor films

2011 - 2012 Development of novel function-controlled inorganic/organic layer-formationtechnology through integrated reaction studies on plasma interactions withnanolayers at surface and interface

2008 - 2009 超短パルスレーザー誘起断熱励起過程による次世代半導体ナノ表面の非熱的改質プロセス

2007 - 2008 高周波誘導結合による新しい液中プラズマ生成法の開発と粒子処理プロセスの開拓

2005 - 2008 Development of hybrid friction stir welding for ferrous-materials by using composite tool with low environmental influence and its joining mechanism

2007 - 2007 フォノン励起型非熱的ナノ表面改質による次世代半導体活性化プロセスの開発

2004 - 2006 気相成長ナノ粒子直接照射による酸化物ナノコンポジット機能材の低温高速成膜法の開発

2004 - 2005 マイクロプラズマスラスターの研究開発

2003 - 2005 Mechanism Investigations and Control of Phonon-Excitation Anneal Process for Ultra-Shallow Junction Formation

2002 - 2004 表面波励起プラズマを用いた超小型プラズマスラスターの研究開発

2002 - 2004 A Study of the Particle Transport and Surface Reactions in Microstructures on Substrates during Plasma Processing

2002 - 2003 コヒーレントフォノン励起による極浅半導体接合の低温活性化に関する基礎研究

2001 - 2003 Development of Plasma Technologies for Advanced Plasma-Based Ion Implantation Processes Using Internal-Antenna-Driven Large-Volume RF Plasma Sources

2001 - 2003 Synthesis of Super-Hard Nano-Composite Films by High Density Plsama Sputtering

2000 - 2001 低インダクタンス型マルチ線状内部アンテナを用いた大容積RFプラズマ源の開発

1998 - 2000 Development of sintering and joining processes of high performance ceramics for next generation by using high power millimeter-wave radiation

1998 - 1999 Development of highly reactive high-density plasma sputtering process with excitation of helicon wave for synthesis of superhard nitride films

1997 - 1999 Research and Development of Ground Simulation Methods for Spacecraft Environment, and Degradation Experiments of Spacecraft Materials

1997 - 1999 Preparation of Super-Hard Nitride Thin Films for Next Generation by High Density Plasma PVD

1997 - 1998 ヘリコン波励起型反応性高密度金属原子混合プラズマの開発と超硬質薄膜合成への応用

1995 - 1996 Formation of Functionally Gradient cBN Films Using Ion Beam

1995 - 1996 Functional Materials Processing by Electromagnetic Heating

1991 - 1992 Study on Functional Surface Modification by Ion Dynamic Mixing Method

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Papers (262)：

Kosuke Takenaka, Soutaro Nakamoto, Ryosuke Koyari, Akiya Jinda, Susumu Toko, Giichiro Uchida, Yuichi Setsuhara. Influence of pre-treatment with non-thermal atmospheric pressure plasma on bond strength of TP340 titanium-PEEK direct bonding. The International Journal of Advanced Manufacturing Technology. 2024
Kosuke Takenaka, Hibiki Komatsu, Taichi Sagano, Keisuke Ide, Susumu Toko, Takayoshi Katase, Toshio Kamiya, Yuichi Setsuhara. Hydrogen-included plasma-assisted reactive sputtering for conductivity control of ultra-wide bandgap amorphous gallium oxide. Japanese Journal of Applied Physics. 2024. 63. 4. 04SP65-04SP65
Susumu Toko, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara. Improving the efficiency of CO2 methanation using a combination of plasma and molecular sieves. Results in Surfaces and Interfaces. 2024. 100204-100204
Kosuke Takenaka, Shota Nunomura, Yuji Hayashi, Hibiki Komatsu, Susumu Toko, Hitoshi Tampo, Yuichi Setsuhara. Stability and gap states of amorphous In-Ga-Zn-Ox thin film transistors: Impact of sputtering configuration and post-annealing on device performance. Thin Solid Films. 2024. 790. 140203-140203
Susumu TOKO, Takamasa OKUMURA, Kunihiro KAMATAKI, Kosuke TAKENAKA, Kazunori KOGA, Masaharu SHIRATANI, Yuichi SETSUHARA. プラズマ触媒作用を用いた二酸化炭素還元反応の促進に関する基礎研究. Journal of Smart Processing. 2024. 13. 1. 31-36

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MISC (112)：

竹中弘祐, 小松響, 藤村知輝, 都甲将, 井手啓介, 江部明憲, 神谷利夫, 節原裕一. Plasma-Assisted Reactive Sputtering for Amorphous Gallium Oxide Thin Film Formation. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2023. 70th
竹中弘祐, 中本壮太郎, 小鑓亮輔, 都甲将, 内田儀一郎, 節原裕一. Development of organic material-metal dissimilar material bonding technology using atmospheric pressure non-equilibrium plasma jet. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2023. 70th
竹中弘祐, 中本壮太郎, 小鑓亮輔, 都甲将, 内田儀一郎, 節原裕一. Effect of Atmospheric Pressure Non-equilibrium RF Plasma Jet Irradiation on Direct Bonding of Metal-Organic Dissimilar Materials. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2023. 84th
都甲将, 奥村賢直, 鎌滝晋礼, 竹中弘祐, 古閑一憲, 白谷正治, 節原裕一. Control of selectivity in hydrogenation of CO₂ using plasma. 応用物理学会秋季学術講演会講演予稿集(CD-ROM). 2023. 84th
竹中弘祐, 吉谷友希, 都甲将, 内田儀一郎, 江部明憲, 節原裕一. Development of Plasma-Assisted Reactive Processes for Large-Area Uniform Formation of High-Mobility IGZO Thin Film Transistors. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2022. 69th

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Patents (86)：

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Books (11)：

Novel Structured Metallic and Inorganic Materials
Springer 2019 ISBN:9789811376108
Plasma Medical Science
Elsevier 2018 ISBN:9780128150047
Comprehensive Materials Processing
Elsevier 2014 ISBN:9780080965321
Справочник по технологии наночастиц ( Nanoparticle Technology Handbook )
Научный мир ( Scientific World Publishing House ) 2013 ISBN:9785915222310
Progress in Advanced Structural and Functional Materials Design
Springer 2013 ISBN:9784431540632

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Lectures and oral presentations (92)：

Low-temperature Formation of High-Mobility In GaZnOx Thin-Film Transistors by Plasma-Enhanced Reactive Processes
(7th Global Nanotechnology Congress and Expo 2019)
Reactive plasma processes for formation of high-mobility IGZO thin-film transistors
(21st International Conference on Advanced Energy Materials and Research 2019)
Low-temperature formation of high-mobility InGaZnOx thin film transistor by ICP-enhanced reactive plasma processes Yuichi Setsuhara
(The 15th International Symposium on Sputtering and Plasma Processes (ISSP2019) 2019)
ICP-Enhanced Reactive Plasma Processes for Low-Temperature Formation of High-Mobility Oxide Semiconductor TFT
(The 5th Asian Workshop on Applied Plasma Science and Engineering 2019 (APSE2019) 2019)
低ダメージ大面積プロセス対応プラズマ生成・制御技術の開発
(2018年度フロンティア材料研究所学術賞受賞記念講演会・若手教員講演会 2018)

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Education (3)：

1988 - 1991 Osaka University Graduate School, Division of Engineering 電気工学専攻
1986 - 1988 Osaka University Graduate School, Division of Engineering 電磁エネルギー工学専攻
1982 - 1986 Osaka University Faculty of Engineering 電気工学科

Professional career (1)：

工学博士 (大阪大学)

Work history (6)：

2004/07 - 現在 Osaka University Joining and Welding Research Institute
2001/06 - 2004/06 Kyoto University Graduate School of Engineering, Department of Aeronautics and Astronautics
1996/05 - 2001/05 Osaka University Joining and Welding Research Institute
1997/04 - 1999/03 通産省工業技術院名古屋工業技術研究所流動研究員併任
1997/02 - 1997/02 国際協力事業団個別専門家委嘱

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Awards (11)：

2018/09 - フロンティア材料研究所フロンティア材料研究所学術賞
2017/03 - ISPlasma2017/IC-PLANTS2017 Best presentation award
2016/09 - 6th International Conference on Plasma Medicine Participants' Poster Prize
2015/09 - 応用物理学会 2015年応用物理学会秋季学術講演会 Poster Award
2012/03 - グローバルCOE プログラム「構造・機能先進材料デザイン教育研究拠点」第5回グローバルCOE プログラム「構造・機能先進材料デザイン教育研究拠点」シンポジウム最優秀ポスター賞

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Association Membership(s) (7)：

日本MRS , 日本真空学会 , 溶接学会 , 日本航空宇宙学会 , 表面技術協会 , 応用物理学会 , スマートプロセス学会

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