Shimizu Hirofumi

シミズヒロフミ | Shimizu Hirofumi

Homepage URL (1)： http://www.ee.ce.nihon-u.ac.jp

Research field (4)： Electronic devices and equipment , Electric/electronic material engineering , Crystal engineering , Applied materials

Research keywords (11)：結晶工学 , 誘電体薄膜 , 表面光電圧 , 機能性絶縁薄膜 , シリコン酸化膜 , 半導体ナノテクノロジー , Crystal Technology , Surface Photovoltage , Insulator Thin Film , Si dioxide , Semiconductor Nanotechnology

Research theme for competitive and other funds (12)：

2003 - 2010 半導体表面の解析、誘電体薄膜の伝導機構の解析及び結晶欠陥に関する研究
2003 - 2010 Study on Semiconductor Surface, Electrical Conduction Mechanism of Oxide Films and Crystal Defects
2002 - 2010 交流表面光電圧法によるシリコン表面における酸化膜電荷、ショットキー障壁に関する研究
2002 - 2010 Study on Oxide charge and Schottky Barrier in Silicon with ac Surface Photovoltage
2002 - 2008 ゾルーゲル法及び蒸着法によるHfO2, ZrO2膜の物性及び電気的特性に関する研究

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Papers (5)：

MISC (206)：

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Patents (1)：

シリコン半導体薄膜の結晶性評価装置及び結晶性評価方法

Books (15)：

よくわかる半導体LSIのできるまで(共著) -ウエーハ製造工程ー
日刊工業新聞社 2006
基礎からの半導体工学(共著)
日新出版 2005
最新シリコンデバイスと結晶技術、
Realize (Science & Engineering) 2005
グローバルスタンダードへの挑戦ー300 mm半導体工場へ向けた標準化の歴史ー 3.5ウエーハ端面形状などについての検討と提案
SEMIジャパン 2003
よくわかるシステムLSIのできるまで(共著) -システムLSI対応ウエーハ製造工程ー
日刊工業新聞社 2002

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Lectures and oral presentations (189)：

Transfer from Schottky-Barrier to Atomic-Bridging Type Surface Photovoltages in Cr-Contaminated n- and p-Type Si(001) Surfaces,
(14th European Conference on Applications of Surface and Interface Analysis (ECASIA’11) 2011)
Metal-Induced Negative Charge Detected by Alternating Current Surface Photovoltage in Thermally Oxidized Fe-contaminated n-Type Silicon Wafers, E-MRS 2011 Spring Meeting, May 9-13, Nice, France.
(European Material Reseach Society (EMRS) 2011)
Photon-Assisted Surface Photovoltage in Thermally Oxidized Metal-Contaminated n-Type Silicon Wafers, 7th International Conference on Photo-Excited Processes and Applications 15-
(7th International Conference on Photo-Excited Processes and Applications 15-20 August 2010, Copenhagen and Sonderborg, Denmark, pp.39. 2010)
Photon-Assisted Surface Photovoltage in Thermally Oxidized Metal-Contaminated n-Type Silicon Wafers, 7th International Conference on Photo-Excited Processes and Applications 15-
(7th International Conference on Photo-Excited Processes and Applications 15-20 August 2010, Copenhagen and Sonderborg, Denmark, pp.39. 2010)
Analyses of Desorbed H2O with Temperature Programmed Desorption Technique in Sol-Gel Derived HfO2 Thin Films,
(16th International Conference on Thermal Engineering and Thermogrammetry (THERMO) 2009)

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Works (30)：

ニオブおよびタンタル誘電体皮膜の研究
2005 - 2006
高感度薄膜半導体評価技術に関する研究
2006 -
半導体及び結晶欠陥の評価技術に関する研究
1999 - 2005
Research on semiconductor crystalline imperfections and characteristic technique
1999 - 2005
半導体材料(寄稿),JETI (Japan Energy and Technology Intelligence)、石油文化社、53 [1], 116-117 (2005).
2005 -

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Education (6)：

- 1972 東北大学大学院工学研究科金属材料工学専攻大学院工学研究科金属材料工学専攻
- 1972 Graduate School of Tohoku University Graduate School, Division of Engineering
- 1969 東北大学大学院工学研究科金属材料工学専攻大学院材料科学研究科金属材料工学専攻
- 1969 Graduate School of Tohoku University Graduate School, Division of Materials Science Material Science
- 1967 Nagoya Institute of Technology Faculty of Engineering

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Professional career (2)：

Ph.D. (Tohoku University)
M.D. (Tohoku University)

Work history (3)：

1999 - -:日本大学・工学部・電気電子工学科・教授
1999 - -:Electrical and Electronic Department, College of Engineering, Nihon University, Professor
Nihon University College of Engineering Department of Electrical and Electronic Engineering Professor

Awards (2)：

1999 - 第47回電気科学技術奨励賞(オーム技術賞)
1988 - 日本金属学会金属組織写真奨励賞

Association Membership(s) (2)：

応用物理学会(Japanese Journal Applied Physics) , Journal of Electrochemical Society

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