Rchr
J-GLOBAL ID:200901077462480211   Update date: Jun. 08, 2020

Okumura Tsugunori

オクムラ ツグノリ | Okumura Tsugunori
Research field  (5): Electronic devices and equipment ,  Electric/electronic material engineering ,  Thin-film surfaces and interfaces ,  Crystal engineering ,  Applied materials
Research keywords  (11): 半導体電子デバイス ,  半導体デバイスプロセス技術 ,  金属-半導体界面 ,  不純物・欠陥評価 ,  化合物半導体 ,  Electron Devices ,  Device Processing Technology ,  Semiconductor Devices ,  Metal-semiconductor Interfaces ,  Defect and Impurity Characterization ,  Compound Semiconductors
Research theme for competitive and other funds  (12):
  • 1999 - 2003 極薄シリコン層の非接触電気特性評価
  • 1999 - 2003 Contactless Electrical Characterization of Ultrathin Silicon Layers
  • 1993 - 半導体におけるプロセス誘起欠陥発生とデバイスの信頼性
  • 1993 - Process-Induced Defect Formation and Relaiblity Issues in Semiconductor Devices
  • 1981 - ショットキー接触の形成と界面の微視的評価
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Papers (99):
MISC (5):
Books (27):
  • Electronic Properties of Materials
    Corona Pub. Co. Ltd. 2013 ISBN:9784339018509
  • 電子材料ハンドブック
    朝倉書店 2006 ISBN:4254221517
  • 電気電子材料 -基礎から試験法まで-
    電気学会(オーム社) 2006 ISBN:4886862527
  • 高周波半導体材料・デバイスの新展開
    シーエムシー出版 2006 ISBN:4882315823
  • Formation of Semiconductor Interfaces
    Elsevier 2002
more...
Lectures and oral presentations  (14):
  • Defects formation in III-Nitride dry process, compared with other conventional III-V
    (2nd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2010)
  • Defects formation in III-Nitride dry process, compared with other conventional III-V
    (2nd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2010)
  • Noncontact Characterization of Thin SOI Materials by the Kelvin-probe Method
    (The 8th International Conference on the Formation of Semiconductor Interfaces 2001)
  • Contactless characterization of surface and interface band-bending in silicon-on-insulator (SOI) structures
    (The 9th International Conference on Defects : Recognition, Imaging and Defects in Semiconductors (DRIP-IX), Italy 2001)
  • Noncontact Characterization of Thin SOI Materials by the Kelvin-probe Method
    (The 8th International Conference on the Formation of Semiconductor Interfaces 2001)
more...
Works (7):
  • Electrical characterization of poly-Si thin films
    2002 - 現在
  • 化合物半導体のプロセスダメージの評価
    1995 - 現在
  • Characterization technique of compound semiconductors for optoelectronic devices
    1995 - 現在
  • Reliability Physics of Semiconductor Devices
    1995 - 現在
  • デバイス高信頼化の研究
    1995 - 2010
more...
Education (2):
  • 1973 - 1978 The University of Tokyo Electrronics
  • 1969 - 1973 Kyoto University Electronics
Professional career (1):
  • Doctor (Engineering) (The University of Tokyo)
Work history (9):
  • 2016/04 - 現在 Tokyo Metropolitan Industrial Technology Research Institute President
  • 2011/04 - 2016/03 Tokyo Metropolitan University Vice President
  • 2009/04 - 2012/03 Faculty of Urban Liberal Arts, Tokyo Metropolitan University. Prof./Dean
  • 2006/04 - 2009/03 同上 大学院理工学研究科長
  • 2006/04 - 2009/03 Prof./Dean, Graduate School of Science & Engineering, Tokyo Metropolitan University.
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Committee career (20):
  • 2013/05 - 現在 (独)新エネルギー・産業技術総合開発機構(NEDO) 技術委員
  • 2011/05 - 現在 (独)日本学術振興会 博士課程教育リーディングプログラム委員会
  • 2008/06 - 現在 (社)首都圏産業活性化協会 会長(2014.6から)
  • 2008/04 - 現在 (独)大学評価・学位授与機構 学位審査会 専門委員
  • 2006/10 - 現在 日本学術会議 連携会員 (総合工学委員会)
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Awards (2):
  • 2007 - 応用物理学会フェロー表彰
  • 2007 - Fellow Award (Japan Society of Applied Physics)
Association Membership(s) (12):
米国電気電子学会(IEEE) ,  日本結晶成長学会 ,  電気学会 ,  電子情報通信学会 ,  応用物理学会 ,  Materials Research Society ,  The Institute of Electrical and Electronics Engineers ,  The Japanese Association for Crystal Growth ,  The Institute of Eletrical Engineers in Japan ,  Information and Communucation Engineers ,  The Institute of Electronics ,  The Japan Society of Applied Physics
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