Art

J-GLOBAL ID：200902100012917950   Reference number：99A0245540

Printing Sub-100 Nanometer Features Near-field Photolithography.

サブ-100nm形状を転写する近視野フォトリソグラフィー

Author (6)： TANAKA S (Univ. Tokyo, Tokyo, JPN) ,  NAKAO M (Univ. Tokyo, Tokyo, JPN) ,  HATAMURA Y (Univ. Tokyo, Tokyo, JPN) ,  KOMURO M (Electrotechnical Lab., Ministry of International Trade and Ind., Ibaraki, JPN) ,  HIROSHIMA H (Electrotechnical Lab., Ministry of International Trade and Ind., Ibaraki, JPN) ,  HATAKEYAMA M (Ebara Res. Co., Ltd., Kanagawa, JPN)
Material： Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers  (Japanese Journal of Applied Physics. Part 1. Regular Papers, Brief Communications & Review Papers)
Volume： 37  Issue： 12B  Page： 6739-6744  Publication year： Dec. 1998 
JST Material Number： G0520B  ISSN： 0021-4922  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *photolithography ,...
Semi thesaurus term： near field(optics) ,...

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JST classification (2)： Manufacturing technology of solid-state devices  (NC03030V) ,  Image formation and analysis  (BD03050I)

Reference (5)：

• 1) Y. Mitsuoka, K. Nakajima, N. Chiba, H. Muramatsu and T. Akata: Ext. Abstr. (58st Autumn Meet., 1997) Japan Society of Applied Physics and Related Societies, 5p-L8 [in Japanese].
• 2) J. A. Rogers, K. E. Paul, R. J. Jackman and G. M. Whitesides: Appl. Phys. Lett. 70 (1997) 2658
• 3) H. Furukawa and S. Kawata: Opt. Commun. 132 (1996) 170.
• 4) Y. Tohma, M. Hatakeyama, K. Ichiki, H. Huang, K. Yamauchi, K. Watanabe and T. Kato: Jpn. J. Appl. Phys. 36 (1997) 7655
• 5) T. Yoshimura, E. W. Scheckler, T. Ogawa, S. Shukuri and H. Shiraishi: Oyo Buturi 63 (1994) 1131 [in Japanese].

Terms in the title (4)： サブ ,  転写 ,  近視野 ,  フォトリソグラフィー