Observation of Oxide-film Step with Very Small Height on Si Wafer Surface Using a Laser Scattering Method

INOUE HARUYUKI; KATAOKA TOSHIHIKO; NAGAO YOSHIHIRO; OSHIKANE YASUSHI; NAKANO MOTOHIRO; OCHI YASUFUMI; ARIMA KENTA; MORITA MIZUHO

Art

J-GLOBAL ID：200902266967551734 Reference number：06A0935305

Observation of Oxide-film Step with Very Small Height on Si Wafer Surface Using a Laser Scattering Method

レーザ光散乱法によるSiウエハ表面上の極薄酸化膜段差の計測

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=06A0935305&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=06A0935305&from=J-GLOBAL&jstjournalNo=F0268B") }}

Author (8)： , , , , , , ,
Material：
Volume： 72 Issue： 11 Page： 1363-1367 Publication year： Nov. 05, 2006
JST Material Number： F0268B ISSN： 1348-8716 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： JAPANESE (JA)

,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=06A0935305&from=J-GLOBAL&jstjournalNo=F0268B") }}

Measurement,testing and reliability of solid-state devices

Reference (9)：

ｍore...

, , , , , ,

Return to Previous Page