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J-GLOBAL ID：201902220795035185
Reference number：19A0890943 Highly effective removal of OH bonds in low-temperature silicon oxide films by annealing with ammonia gas at a low temperature of 175 °C
低温でのアンモニアガスでのアニーリングによる低温酸化ケイ素膜中のOH結合の高効率除去
ClipsHORITA Susumu
About HORITA Susumu
(Japan Advanced Inst. of Sci. and Technol., Ishikawa, JPN)
About Japan Advanced Inst. of Sci. and Technol., Ishikawa, JPN
Material：
Japanese Journal of Applied Physics
(JJAP)
About Japanese Journal of Applied Physics
Volume： 58 Issue： 3 Page： 038002.1-038002.4 Publication year： Mar. 2019
JST Material Number： G0520B ISSN： 0021-4922 CODEN： JJAPB6 Document type： Article
Article type： 短報 Country of issue： United Kingdom (GBR) Language： ENGLISH (EN)
Thesaurus term：
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*low temperature
, About low temperature
*Ammonia
, About Ammonia
*annealing (heat treatment)
, About annealing (heat treatment)
*silicon oxide
, About silicon oxide
oxide film
, About oxide film
removal
, About removal
FTIR spectroscopy
, About FTIR spectroscopy
gas
, About gas
Lewis base
, About Lewis base
nitrogen gas
, About nitrogen gas
conversion coating film
About conversion coating film
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*annealing treatment
, About annealing treatment
Catalysis
About Catalysis
JST classification (1)：
JST classification
Category name(code) classified by JST.
Oxide thin films
Category name(code) classified by JST.
(BK14050P)
About Oxide thin films
Reference (23)：
- S. Higashi, D. Abe, S. Inoue, and T. Shimoda, Japan. J. Appl. Phys. 40, 4171 (2001).
- M. M. Moslehi, R. A. Chapman, M. Wong, A. Paranjpe, H. N. Najm, J. Kuehn, R. L. Yeakley, and C. J. Davis, IEEE Trans. Electron Devices 39, 4 (1992).
- T. Kawahara, A. Yuuki, and Y. Matsui, Jpn. J. Appl. Phys. 31, 2925 (1992).
- K. Murase, N. Yabumoto, and Y. Komine, J. Electrochem. Soc. 140, 1722 (1993).
- M. Yoshimaru and T. Yoshie, J. Electrochem. Soc. 145, 2847 (1998).
Terms in the title (6)：
Terms in the title
Keywords automatically extracted from the title.
Keywords automatically extracted from the title.
低温
, About 低温
アンモニアガス
, About アンモニアガス
アニーリング
, About アニーリング
低温酸化
, About 低温酸化
ケイ素膜
, About ケイ素膜
高効率
About 高効率
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