Rchr
J-GLOBAL ID:201301038861065071   Update date: Jan. 30, 2024

Wakabayashi Hitoshi

ワカバヤシ ヒトシ | Wakabayashi Hitoshi
Affiliation and department:
Job title: 教授
Research field  (1): Electronic devices and equipment
Research theme for competitive and other funds  (6):
  • 2022 - 2025 Growth mechanism and thermoelectric conversion property of transition metal dichalcogenides thin films
  • 2020 - 2025 社会実装に向けた超秩序構造物質ライブラリーに基づく合成プロセス開発
  • 2018 - 2021 Self-Heating-Effect-Free p/n-Stacked-NW/Bulk-FinFETs and 6T-SRAM
  • 2014 - 2019 Control of 3D atomic structures of impurities doped in semiconductors and its application to low-loss high efficient devices
  • 2016 - 2018 Challenge to fabricate 3D structure of atomically thin TMDC film for future 2D-MISFET
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Papers (110):
  • K. Cho, N. Sawamoto, H. Machida, M. Ishikawa, H. Sudoh, H. Wakabayashi, R. Yokogawa, A. Ogura. Conformal deposition of WS2 layered film by low-temperature metal-organic chemical vapor deposition. Japanese Journal of Applied Physics. 2023. 62. SG. SG1048-SG1048
  • Masaki Otomo, Masaya Hamada, Ryo Ono, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi. Chemical states of PVD-ZrS2 film underneath scaled high-k film with self-oxidized ZrO2 film as interfacial layer. Japanese Journal of Applied Physics. 2023. 62. SC. SC1015-SC1015
  • Takamasa Kawanago, Ryosuke Kajikawa, Kazuto Mizutani, Sung-Lin Tsai, Iriya Muneta, Takuya Hoshii, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi. Doping-Free Complementary Metal-Oxide-Semiconductor Inverter Based on N-Type and P-Type Tungsten Diselenide Field-Effect Transistors With Aluminum-Scandium Alloy and Tungsten Oxide for Source/Drain Contact. IEEE Journal of the Electron Devices Society. 2023. 11. 15-21
  • Iriya Muneta, Takanori Shirokura, Pham Nam Hai, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi. Ferromagnetism modulation by ultralow current in a two-dimensional polycrystalline molybdenum disulphide atomic layered structure. Scientific Reports. 2022. 12. 1
  • Taiga Horiguchi, Takuya Hamada, Masaya Hamada, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Tetsuya Tatsumi, Shigetaka Tomiya, Hitoshi Wakabayashi. Positive Seebeck coefficient of niobium-doped MoS2 film deposited by sputtering and activated by sulfur vapor annealing. JAPANESE JOURNAL OF APPLIED PHYSICS. 2022. 61. 7
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MISC (308):
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Patents (57):
Professional career (1):
  • Doctor of Engineering (Tokyo Institute of Technology)
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