X-ray Diffraction Study of Crystal Surfaces Interfaces and thin films
Characterization of Semiconductor Materials by Synchrotron Radiation X-ray.
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論文 (543件)：
Takuma Kobayashi, Asato Suzuki, Takato Nakanuma, Mitsuru Sometani, Mitsuo Okamoto, Akitaka Yoshigoe, Takayoshi Shimura, Heiji Watanabe. Characterization of nitrided SiC(1-100) MOS structures by means of electrical measurements and X-ray photoelectron spectroscopy. Materials Science in Semiconductor Processing. 2024. 175. 108251-108251
Sosuke Iwamoto, Takayoshi Shimura, Heiji WATANABE, Takuma Kobayashi. Oxygen-related defects in 4H-SiC from first principles. Applied Physics Express. 2024
Kentaro Onishi, Takato Nakanuma, Kosuke Tahara, Katsuhiro KUTSUKI, Takayoshi Shimura, Heiji WATANABE, Takuma Kobayashi. Generation of single photon emitters at a SiO2/SiC interface by high-temperature oxidation and reoxidation at lower temperatures. Applied Physics Express. 2024
Takuma Kobayashi, Kazuki Tomigahara, Mikito Nozaki, Takayoshi Shimura, Heiji Watanabe. Separate evaluation of interface and oxide hole traps in SiO2/GaN MOS structures with below- and above-gap light excitation. Applied Physics Express. 2023. 17. 1. 011003-011003
Tae-Hyeon Kil, Takuma Kobayashi, Takayoshi Shimura, Heiji Watanabe. Design of SiO2/4H-SiC MOS interfaces by sputter deposition of SiO2 followed by high-temperature CO2-post deposition annealing. AIP Advances. 2023. 13. 11. 115304-1-115304-5
T. Shimura, H. Oka, T. Hosoi, Y. Imai, S. Kimura, H. Watanabe. Fabrication of Tensile-strained Single-crystalline GeSn Wires on Amorphous Quartz Substrates by Local Liquid-phase Crystallization. Proceedings of The 8th International Symposium on Advanced Science and Technology of Silicon Materials. 2022. 143-146
Epitaxially Ordered Structure in the Buried Oxide Layer of SIMOX Waters
The Physics and Chemistry of SiO<sub>2</sub> and the Si-SiO<sub>2</sub> Interface 4,(The Electrochemical Society, INC) 2000
Analysis of Orderd Structure of Buried Oxide Layers in SIMOX Waters
1999
Advances in the Understanding of Crystal Growth Mechanisms
Elsevier Science 1997
Thermally Oxidized Layers on Si-wafers-Surface X-ray Scattering and Field Ion Microscopy-(共著)
1997
Structure of thermal Oxide on(111)and(011)Si Wafers(共著)
1996
2016/09 - 公益社団法人 応用物理学会 第8回(2016年秋季)応用物理学会 Poster Award
2016/03 - 応用物理学会 第7回(2016年春季)応用物理学会 Poster Award
2014/03 - 応用物理学会 第3回(2014年春季)応用物理学会 Poster Award
2008/11 - The Japan Society of Applied Physics, Japan 2008 IWDTF Best Poster Award
所属学会 (11件)：
日本放射光学会
, 応用物理学会
, 日本結晶学会
, 日本物理学会
, The Japanese Society for Synchrotron Radiation Research
, The Japan Society of Applied Physics
, The Crystallographic Society of Japan
, The Physical Society of Japan
, 放射光学会
, 結晶学会
, 物理学会
